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    Rapid Anneal-Free Welding of Cu Nanowires Network by Ultraviolet Light Irradiation for Transparent Electrodes in Optoelectronic Applications

    Source: Journal of Electronic Packaging:;2020:;volume( 142 ):;issue: 003
    Author:
    Wang, Jun
    ,
    Zhao, Yang
    ,
    Chen, Han
    ,
    Tang, Yan
    ,
    Liu, Guozhen
    ,
    Liang, Renli
    ,
    Dai, Jiangnan
    ,
    Chen, Changqing
    ,
    Kang, Junyong
    ,
    Cai, Duanjun
    DOI: 10.1115/1.4046764
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: We demonstrate a novel ultraviolet (UV) light irradiation strategy to rapidly weld Cu nanowires (NWs) network and remove the organic residues for transparent electrodes. Shortly irradiated by UV light source, the Cu NWs could achieve junction welding in the absence of any thermal annealing process. This Cu NWs network shows high optoelectronic performance (39 Ω/sq at 90% transmittance at 550 nm) and outstanding flexibility under bending and twisting. Completely transparent light-emitting diode (LED) chips array was fabricated and has been lighted with bright top-surface emission. This method could provide a fast and convenient way to fabricate Cu NWs transparent electrodes onto various optoelectronic products.
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      Rapid Anneal-Free Welding of Cu Nanowires Network by Ultraviolet Light Irradiation for Transparent Electrodes in Optoelectronic Applications

    URI
    http://yetl.yabesh.ir/yetl1/handle/yetl/4273917
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    contributor authorWang, Jun
    contributor authorZhao, Yang
    contributor authorChen, Han
    contributor authorTang, Yan
    contributor authorLiu, Guozhen
    contributor authorLiang, Renli
    contributor authorDai, Jiangnan
    contributor authorChen, Changqing
    contributor authorKang, Junyong
    contributor authorCai, Duanjun
    date accessioned2022-02-04T14:33:46Z
    date available2022-02-04T14:33:46Z
    date copyright2020/04/17/
    date issued2020
    identifier issn1043-7398
    identifier otherep_142_03_031102.pdf
    identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4273917
    description abstractWe demonstrate a novel ultraviolet (UV) light irradiation strategy to rapidly weld Cu nanowires (NWs) network and remove the organic residues for transparent electrodes. Shortly irradiated by UV light source, the Cu NWs could achieve junction welding in the absence of any thermal annealing process. This Cu NWs network shows high optoelectronic performance (39 Ω/sq at 90% transmittance at 550 nm) and outstanding flexibility under bending and twisting. Completely transparent light-emitting diode (LED) chips array was fabricated and has been lighted with bright top-surface emission. This method could provide a fast and convenient way to fabricate Cu NWs transparent electrodes onto various optoelectronic products.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleRapid Anneal-Free Welding of Cu Nanowires Network by Ultraviolet Light Irradiation for Transparent Electrodes in Optoelectronic Applications
    typeJournal Paper
    journal volume142
    journal issue3
    journal titleJournal of Electronic Packaging
    identifier doi10.1115/1.4046764
    page31102
    treeJournal of Electronic Packaging:;2020:;volume( 142 ):;issue: 003
    contenttypeFulltext
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