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    Orientation Dependent Hardness in As Deposited and Low Temperature Annealed Ti/Ni Multilayer Thin Films

    Source: Journal of Applied Mechanics:;2015:;volume( 082 ):;issue: 001::page 11008
    Author:
    Yang, Zhou
    ,
    Wang, Junlan
    DOI: 10.1115/1.4029058
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Strong orientation dependent hardness has been observed in both asdeposited and lowtemperature annealed Ti/Ni multilayer thin films. The anisotropic hardness of asdeposited films is attributed to dominant deformation mechanism switch from dislocation pileup against the interfaces to confined layer slip (CLS) within the layers as the loading direction changes from perpendicular to parallel to the interfaces. Additional strengthening of the multilayers is achieved after lowtemperature annealing without noticeable microstructure modification due to temperatureinduced grain boundary relaxation. This thermal strengthening is found to increase with decreasing layer thickness and increasing annealing temperature, and is more pronounced for loading directions parallel to the interfaces.
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      Orientation Dependent Hardness in As Deposited and Low Temperature Annealed Ti/Ni Multilayer Thin Films

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    contributor authorYang, Zhou
    contributor authorWang, Junlan
    date accessioned2017-05-09T01:14:32Z
    date available2017-05-09T01:14:32Z
    date issued2015
    identifier issn0021-8936
    identifier otherjam_082_01_011008.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/156902
    description abstractStrong orientation dependent hardness has been observed in both asdeposited and lowtemperature annealed Ti/Ni multilayer thin films. The anisotropic hardness of asdeposited films is attributed to dominant deformation mechanism switch from dislocation pileup against the interfaces to confined layer slip (CLS) within the layers as the loading direction changes from perpendicular to parallel to the interfaces. Additional strengthening of the multilayers is achieved after lowtemperature annealing without noticeable microstructure modification due to temperatureinduced grain boundary relaxation. This thermal strengthening is found to increase with decreasing layer thickness and increasing annealing temperature, and is more pronounced for loading directions parallel to the interfaces.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleOrientation Dependent Hardness in As Deposited and Low Temperature Annealed Ti/Ni Multilayer Thin Films
    typeJournal Paper
    journal volume82
    journal issue1
    journal titleJournal of Applied Mechanics
    identifier doi10.1115/1.4029058
    journal fristpage11008
    journal lastpage11008
    identifier eissn1528-9036
    treeJournal of Applied Mechanics:;2015:;volume( 082 ):;issue: 001
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
    نرم افزار کتابخانه دیجیتال "دی اسپیس" فارسی شده توسط یابش برای کتابخانه های ایرانی | تماس با یابش
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