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contributor authorYang, Zhou
contributor authorWang, Junlan
date accessioned2017-05-09T01:14:32Z
date available2017-05-09T01:14:32Z
date issued2015
identifier issn0021-8936
identifier otherjam_082_01_011008.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/156902
description abstractStrong orientation dependent hardness has been observed in both asdeposited and lowtemperature annealed Ti/Ni multilayer thin films. The anisotropic hardness of asdeposited films is attributed to dominant deformation mechanism switch from dislocation pileup against the interfaces to confined layer slip (CLS) within the layers as the loading direction changes from perpendicular to parallel to the interfaces. Additional strengthening of the multilayers is achieved after lowtemperature annealing without noticeable microstructure modification due to temperatureinduced grain boundary relaxation. This thermal strengthening is found to increase with decreasing layer thickness and increasing annealing temperature, and is more pronounced for loading directions parallel to the interfaces.
publisherThe American Society of Mechanical Engineers (ASME)
titleOrientation Dependent Hardness in As Deposited and Low Temperature Annealed Ti/Ni Multilayer Thin Films
typeJournal Paper
journal volume82
journal issue1
journal titleJournal of Applied Mechanics
identifier doi10.1115/1.4029058
journal fristpage11008
journal lastpage11008
identifier eissn1528-9036
treeJournal of Applied Mechanics:;2015:;volume( 082 ):;issue: 001
contenttypeFulltext


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