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    Raman and Infrared Thermometry for Microsystems

    Source: Journal of Thermal Science and Engineering Applications:;2013:;volume( 005 ):;issue: 003::page 31011
    Author:
    Phinney, Leslie M.
    ,
    Lu, Wei
    ,
    Serrano, Justin R.
    DOI: 10.1115/1.4023395
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: This paper reports and compares Raman and infrared thermometry measurements along the legs and on the shuttle of a SOI (silicon on insulator) bentbeam thermal microactuator. Raman thermometry offers micron spatial resolution and measurement uncertainties of آ±10 K. Typical data collection times are a minute per location leading to measurement times on the order of hours for a complete temperature profile. Infrared thermometry obtains a fullfield measurement so the data collection time is on the order of a minute. The spatial resolution is determined by the pixel size, 25 خ¼m by 25 خ¼m for the system used, and infrared thermometry also has uncertainties of آ±10 K after calibration with a nonpackaged sample. The Raman and infrared measured temperatures agreed both qualitatively and quantitatively. For example, when the thermal microactuator was operated at 7 V, the peak temperature on an interior leg is 437 K آ±â€‰10 K and 433 K آ±â€‰10 K from Raman and infrared thermometry, respectively. The two techniques are complementary for microsystems characterization when infrared imaging obtains a fullfield temperature measurement and Raman thermometry interrogates regions for which higher spatial resolution is required.
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      Raman and Infrared Thermometry for Microsystems

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    contributor authorPhinney, Leslie M.
    contributor authorLu, Wei
    contributor authorSerrano, Justin R.
    date accessioned2017-05-09T01:02:53Z
    date available2017-05-09T01:02:53Z
    date issued2013
    identifier issn1948-5085
    identifier othertsea_5_3_031011.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/153248
    description abstractThis paper reports and compares Raman and infrared thermometry measurements along the legs and on the shuttle of a SOI (silicon on insulator) bentbeam thermal microactuator. Raman thermometry offers micron spatial resolution and measurement uncertainties of آ±10 K. Typical data collection times are a minute per location leading to measurement times on the order of hours for a complete temperature profile. Infrared thermometry obtains a fullfield measurement so the data collection time is on the order of a minute. The spatial resolution is determined by the pixel size, 25 خ¼m by 25 خ¼m for the system used, and infrared thermometry also has uncertainties of آ±10 K after calibration with a nonpackaged sample. The Raman and infrared measured temperatures agreed both qualitatively and quantitatively. For example, when the thermal microactuator was operated at 7 V, the peak temperature on an interior leg is 437 K آ±â€‰10 K and 433 K آ±â€‰10 K from Raman and infrared thermometry, respectively. The two techniques are complementary for microsystems characterization when infrared imaging obtains a fullfield temperature measurement and Raman thermometry interrogates regions for which higher spatial resolution is required.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleRaman and Infrared Thermometry for Microsystems
    typeJournal Paper
    journal volume5
    journal issue3
    journal titleJournal of Thermal Science and Engineering Applications
    identifier doi10.1115/1.4023395
    journal fristpage31011
    journal lastpage31011
    identifier eissn1948-5093
    treeJournal of Thermal Science and Engineering Applications:;2013:;volume( 005 ):;issue: 003
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
    نرم افزار کتابخانه دیجیتال "دی اسپیس" فارسی شده توسط یابش برای کتابخانه های ایرانی | تماس با یابش
    yabeshDSpacePersian