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contributor authorPhinney, Leslie M.
contributor authorLu, Wei
contributor authorSerrano, Justin R.
date accessioned2017-05-09T01:02:53Z
date available2017-05-09T01:02:53Z
date issued2013
identifier issn1948-5085
identifier othertsea_5_3_031011.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/153248
description abstractThis paper reports and compares Raman and infrared thermometry measurements along the legs and on the shuttle of a SOI (silicon on insulator) bentbeam thermal microactuator. Raman thermometry offers micron spatial resolution and measurement uncertainties of آ±10 K. Typical data collection times are a minute per location leading to measurement times on the order of hours for a complete temperature profile. Infrared thermometry obtains a fullfield measurement so the data collection time is on the order of a minute. The spatial resolution is determined by the pixel size, 25 خ¼m by 25 خ¼m for the system used, and infrared thermometry also has uncertainties of آ±10 K after calibration with a nonpackaged sample. The Raman and infrared measured temperatures agreed both qualitatively and quantitatively. For example, when the thermal microactuator was operated at 7 V, the peak temperature on an interior leg is 437 K آ±â€‰10 K and 433 K آ±â€‰10 K from Raman and infrared thermometry, respectively. The two techniques are complementary for microsystems characterization when infrared imaging obtains a fullfield temperature measurement and Raman thermometry interrogates regions for which higher spatial resolution is required.
publisherThe American Society of Mechanical Engineers (ASME)
titleRaman and Infrared Thermometry for Microsystems
typeJournal Paper
journal volume5
journal issue3
journal titleJournal of Thermal Science and Engineering Applications
identifier doi10.1115/1.4023395
journal fristpage31011
journal lastpage31011
identifier eissn1948-5093
treeJournal of Thermal Science and Engineering Applications:;2013:;volume( 005 ):;issue: 003
contenttypeFulltext


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