A Novel Slurry for Atomic-Scale Polishing of Potassium Dihydrogen Phosphate Crystals

Abstract

Atomic-scale surfaces and structures have been playing a significant role in the next generation of devices and products. Potassium dihydrogen phosphate (KDP) crystals are crucial in energy sectors but challenging for ultra-precision processing due to deliquescence, brittleness, and low hardness. This article introduces a novel chemo-mechanical slurry designed for achieving atomic-scale polishing of KDP crystals. The slurry employs a combination of polyethylene glycol (PEG) and anhydrous ethanol (AE) to counter deliquescence. In addition, graphite oxide (GO) with KOH is incorporated to prevent the embedding of SiO2 abrasives and the dissolution of KDP in de-ionized water (DW). The mechanism underlying the formation of an ultra-smooth surface is elucidated based on the analysis of the X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) test. The response surface method (RSM) is used to optimize the slurry parameters and finally to obtain an atomic-scale surface with Sa 0.3 nm.