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contributor authorGuo, Jiang
contributor authorYang, Zhe
contributor authorYu, Xuewen
contributor authorZhang, Pengfei
contributor authorWang, Zhenzhong
contributor authorYu, Nan
contributor authorTian, Yebing
date accessioned2024-12-24T19:10:10Z
date available2024-12-24T19:10:10Z
date copyright8/29/2024 12:00:00 AM
date issued2024
identifier issn1087-1357
identifier othermanu_146_10_101008.pdf
identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4303415
description abstractAtomic-scale surfaces and structures have been playing a significant role in the next generation of devices and products. Potassium dihydrogen phosphate (KDP) crystals are crucial in energy sectors but challenging for ultra-precision processing due to deliquescence, brittleness, and low hardness. This article introduces a novel chemo-mechanical slurry designed for achieving atomic-scale polishing of KDP crystals. The slurry employs a combination of polyethylene glycol (PEG) and anhydrous ethanol (AE) to counter deliquescence. In addition, graphite oxide (GO) with KOH is incorporated to prevent the embedding of SiO2 abrasives and the dissolution of KDP in de-ionized water (DW). The mechanism underlying the formation of an ultra-smooth surface is elucidated based on the analysis of the X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) test. The response surface method (RSM) is used to optimize the slurry parameters and finally to obtain an atomic-scale surface with Sa 0.3 nm.
publisherThe American Society of Mechanical Engineers (ASME)
titleA Novel Slurry for Atomic-Scale Polishing of Potassium Dihydrogen Phosphate Crystals
typeJournal Paper
journal volume146
journal issue10
journal titleJournal of Manufacturing Science and Engineering
identifier doi10.1115/1.4066184
journal fristpage101008-1
journal lastpage101008-10
page10
treeJournal of Manufacturing Science and Engineering:;2024:;volume( 146 ):;issue: 010
contenttypeFulltext


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