Reducing Variability in Chemical Vapor Deposition of Carbon Nanotubes Based on Gas Purification and Sample Support RedesignSource: Journal of Micro and Nano-Manufacturing:;2021:;volume( 009 ):;issue: 001::page 011002-1DOI: 10.1115/1.4050010Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: The synthesis of vertically aligned carbon nanotubes (CNTs), also referred to as CNT forest, by chemical vapor deposition (CVD) is an intricate process that is sensitive to multiple factors other than control of temperature, pressure, and gas flows. In particular, growth is highly sensitive to factors like ambient humidity, as well as small quantities of oxygen-containing species and carbon deposits inside the reactor. These typically uncontrolled factors significantly affect growth reproducibility and hinders the fundamental study of process–structure–property relationship for these emerging materials. Accordingly, universally applicable design modifications and process steps toward improving growth consistency are sought after. In this study, we introduce two new modifications to our custom-designed multizone rapid thermal CVD reactor and demonstrate their impact on growth: (1) reconfiguring the inlet gas plumbing to add a gas purifier to the helium (He) line, and (2) designing a new support wafer for consistent loading of substrates. We use statistical analysis to test the effectiveness of these modifications in improving growth and reducing variability of both CNT forest height and density. Analysis of our experimental results and hypothesis testing show that combining the implementation of He purifier with the redesigned support wafer increases forest height and reduces the variability in height (17-folds), both at statistically significant and practically significant levels.
|
Collections
Show full item record
contributor author | Tomaraei, Golnaz | |
contributor author | Lee, Jaegeun | |
contributor author | Abdulhafez, Moataz | |
contributor author | Bedewy, Mostafa | |
date accessioned | 2022-02-05T22:41:16Z | |
date available | 2022-02-05T22:41:16Z | |
date copyright | 3/2/2021 12:00:00 AM | |
date issued | 2021 | |
identifier issn | 2166-0468 | |
identifier other | jmnm_009_01_011002.pdf | |
identifier uri | http://yetl.yabesh.ir/yetl1/handle/yetl/4277977 | |
description abstract | The synthesis of vertically aligned carbon nanotubes (CNTs), also referred to as CNT forest, by chemical vapor deposition (CVD) is an intricate process that is sensitive to multiple factors other than control of temperature, pressure, and gas flows. In particular, growth is highly sensitive to factors like ambient humidity, as well as small quantities of oxygen-containing species and carbon deposits inside the reactor. These typically uncontrolled factors significantly affect growth reproducibility and hinders the fundamental study of process–structure–property relationship for these emerging materials. Accordingly, universally applicable design modifications and process steps toward improving growth consistency are sought after. In this study, we introduce two new modifications to our custom-designed multizone rapid thermal CVD reactor and demonstrate their impact on growth: (1) reconfiguring the inlet gas plumbing to add a gas purifier to the helium (He) line, and (2) designing a new support wafer for consistent loading of substrates. We use statistical analysis to test the effectiveness of these modifications in improving growth and reducing variability of both CNT forest height and density. Analysis of our experimental results and hypothesis testing show that combining the implementation of He purifier with the redesigned support wafer increases forest height and reduces the variability in height (17-folds), both at statistically significant and practically significant levels. | |
publisher | The American Society of Mechanical Engineers (ASME) | |
title | Reducing Variability in Chemical Vapor Deposition of Carbon Nanotubes Based on Gas Purification and Sample Support Redesign | |
type | Journal Paper | |
journal volume | 9 | |
journal issue | 1 | |
journal title | Journal of Micro and Nano-Manufacturing | |
identifier doi | 10.1115/1.4050010 | |
journal fristpage | 011002-1 | |
journal lastpage | 011002-8 | |
page | 8 | |
tree | Journal of Micro and Nano-Manufacturing:;2021:;volume( 009 ):;issue: 001 | |
contenttype | Fulltext |