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contributor authorAizawa, T.
contributor authorSuga, H.
contributor authorNagata, T.
contributor authorYamaguchi, T.
date accessioned2017-11-25T07:18:37Z
date available2017-11-25T07:18:37Z
date copyright2017/23/3
date issued2017
identifier issn2166-0468
identifier otherjmnm_005_02_021004.pdf
identifier urihttp://138.201.223.254:8080/yetl1/handle/yetl/4235279
description abstractThe initial microdot and microline patterns were first ink-jet printed onto the surface of polished AISI420 stainless steel mold. This masked mold substrate was nitrided at 693 K for 7.2 ks at 70 Pa by using the high-density plasma nitriding system. The unmasked parts were selectively nitrided to have higher hardness than 1200 HV. This hardness-profiled substrate was mechanically sand-blasted to fabricate the microtextured mold. Microdisk patterned plastic cover-case for cellular phones were injection-molded by using this method for practical demonstration. Both the selective hardening and anisotropic inner nitriding processes were experimentally discussed as a key step in the present processing.
publisherThe American Society of Mechanical Engineers (ASME)
titleMicrotexturing Into AISI-SUS420 Molds for Injection Molding Via Plasma Nitriding
typeJournal Paper
journal volume5
journal issue2
journal titleJournal of Micro and Nano-Manufacturing
identifier doi10.1115/1.4035953
journal fristpage21004
journal lastpage021004-8
treeJournal of Micro and Nano-Manufacturing:;2017:;volume( 005 ):;issue: 002
contenttypeFulltext


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