contributor author | Marconnet, Amy M. | |
contributor author | Asheghi, Mehdi | |
contributor author | Goodson, Kenneth E. | |
date accessioned | 2017-05-09T00:59:47Z | |
date available | 2017-05-09T00:59:47Z | |
date issued | 2013 | |
identifier issn | 0022-1481 | |
identifier other | ht_135_6_061601.pdf | |
identifier uri | http://yetl.yabesh.ir/yetl/handle/yetl/152137 | |
description abstract | Silicononinsulator (SOI) technology has sparked advances in semiconductor and MEMs manufacturing and revolutionized our ability to study phonon transport phenomena by providing singlecrystal silicon layers with thickness down to a few tens of nanometers. These nearly perfect crystalline silicon layers are an ideal platform for studying ballistic phonon transport and the coupling of boundary scattering with other mechanisms, including impurities and periodic pores. Early studies showed clear evidence of the size effect on thermal conduction due to phonon boundary scattering in films down to 20 nm thick and provided the first compelling room temperature evidence for the Casimir limit at room temperature. More recent studies on ultrathin films and periodically porous thin films are exploring the possibility of phonon dispersion modifications in confined geometries and porous films. | |
publisher | The American Society of Mechanical Engineers (ASME) | |
title | From the Casimir Limit to Phononic Crystals: 20 Years of Phonon Transport Studies Using Silicon on Insulator Technology | |
type | Journal Paper | |
journal volume | 135 | |
journal issue | 6 | |
journal title | Journal of Heat Transfer | |
identifier doi | 10.1115/1.4023577 | |
journal fristpage | 61601 | |
journal lastpage | 61601 | |
identifier eissn | 1528-8943 | |
tree | Journal of Heat Transfer:;2013:;volume( 135 ):;issue: 006 | |
contenttype | Fulltext | |