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    Contribution of Ballistic Electron Transport to Energy Transfer During Electron-Phonon Nonequilibrium in Thin Metal Films

    Source: Journal of Heat Transfer:;2009:;volume( 131 ):;issue: 004::page 43208
    Author:
    Patrick E. Hopkins
    ,
    Pamela M. Norris
    DOI: 10.1115/1.3072929
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: With the ever decreasing characteristic lengths of nanomaterials, nonequilibrium electron-phonon scattering can be affected by additional scattering processes at the interface of two materials. Electron-interface scattering would lead to another path of energy flow for the high-energy electrons other than electron-phonon coupling in a single material. Traditionally, electron-phonon coupling in transport is analyzed with a diffusion (Fourier) based model, such as the two temperature model (TTM). However, in thin films with thicknesses less than the electron mean free path, ballistic electron transport could lead to electron-interface scattering, which is not taken into account in the TTM. The ballistic component of electron transport, leading to electron-interface scattering during ultrashort pulsed laser heating, is studied here by a ballistic-diffusive approximation of the Boltzmann transport equation. The results for electron-phonon equilibration times are compared with calculations with TTM based approximations and experimental data on Au thin films.
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      Contribution of Ballistic Electron Transport to Energy Transfer During Electron-Phonon Nonequilibrium in Thin Metal Films

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    contributor authorPatrick E. Hopkins
    contributor authorPamela M. Norris
    date accessioned2017-05-09T00:33:53Z
    date available2017-05-09T00:33:53Z
    date copyrightApril, 2009
    date issued2009
    identifier issn0022-1481
    identifier otherJHTRAO-27859#043208_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/141094
    description abstractWith the ever decreasing characteristic lengths of nanomaterials, nonequilibrium electron-phonon scattering can be affected by additional scattering processes at the interface of two materials. Electron-interface scattering would lead to another path of energy flow for the high-energy electrons other than electron-phonon coupling in a single material. Traditionally, electron-phonon coupling in transport is analyzed with a diffusion (Fourier) based model, such as the two temperature model (TTM). However, in thin films with thicknesses less than the electron mean free path, ballistic electron transport could lead to electron-interface scattering, which is not taken into account in the TTM. The ballistic component of electron transport, leading to electron-interface scattering during ultrashort pulsed laser heating, is studied here by a ballistic-diffusive approximation of the Boltzmann transport equation. The results for electron-phonon equilibration times are compared with calculations with TTM based approximations and experimental data on Au thin films.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleContribution of Ballistic Electron Transport to Energy Transfer During Electron-Phonon Nonequilibrium in Thin Metal Films
    typeJournal Paper
    journal volume131
    journal issue4
    journal titleJournal of Heat Transfer
    identifier doi10.1115/1.3072929
    journal fristpage43208
    identifier eissn1528-8943
    treeJournal of Heat Transfer:;2009:;volume( 131 ):;issue: 004
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
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