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    Tilt and Interfacial Fluid Pressure Measurements of a Disk Sliding on a Polymeric Pad

    Source: Journal of Tribology:;2005:;volume( 127 ):;issue: 001::page 198
    Author:
    Sum Huan Ng
    ,
    Len Borucki
    ,
    C. Fred Higgs
    ,
    Inho Yoon
    ,
    Andrés Osorno
    ,
    Steven Danyluk
    DOI: 10.1115/1.1829718
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Previous experimental work has shown that negative fluid pressure does develop at the disk/pad interface during chemical mechanical polishing. However, these studies dealt with one-dimensional measurement and modeling. To better understand the problem, two-dimensional pressure mapping is carried out. In addition, the orientation of the disk is measured with a capacitive sensing technique. Results reveal a large negative pressure region at the disk/pad interface that is skewed toward the leading edge of the disk. The disk is also found to be leaning down toward the leading edge and toward the center of the pad. A mixed-lubrication model based on the Reynolds equation and taking into account the disk orientation angles has been developed. Modeling and experimental results show similar trends, indicating the tilting of the disk as a dominant factor in causing the negative pressure phenomenon.
    keyword(s): Pressure , Fluid pressure , Stress , Disks , Semiconductor wafers , Equations AND Measurement ,
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      Tilt and Interfacial Fluid Pressure Measurements of a Disk Sliding on a Polymeric Pad

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    http://yetl.yabesh.ir/yetl1/handle/yetl/132753
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    contributor authorSum Huan Ng
    contributor authorLen Borucki
    contributor authorC. Fred Higgs
    contributor authorInho Yoon
    contributor authorAndrés Osorno
    contributor authorSteven Danyluk
    date accessioned2017-05-09T00:18:03Z
    date available2017-05-09T00:18:03Z
    date copyrightJanuary, 2005
    date issued2005
    identifier issn0742-4787
    identifier otherJOTRE9-28729#198_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/132753
    description abstractPrevious experimental work has shown that negative fluid pressure does develop at the disk/pad interface during chemical mechanical polishing. However, these studies dealt with one-dimensional measurement and modeling. To better understand the problem, two-dimensional pressure mapping is carried out. In addition, the orientation of the disk is measured with a capacitive sensing technique. Results reveal a large negative pressure region at the disk/pad interface that is skewed toward the leading edge of the disk. The disk is also found to be leaning down toward the leading edge and toward the center of the pad. A mixed-lubrication model based on the Reynolds equation and taking into account the disk orientation angles has been developed. Modeling and experimental results show similar trends, indicating the tilting of the disk as a dominant factor in causing the negative pressure phenomenon.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleTilt and Interfacial Fluid Pressure Measurements of a Disk Sliding on a Polymeric Pad
    typeJournal Paper
    journal volume127
    journal issue1
    journal titleJournal of Tribology
    identifier doi10.1115/1.1829718
    journal fristpage198
    journal lastpage205
    identifier eissn1528-8897
    keywordsPressure
    keywordsFluid pressure
    keywordsStress
    keywordsDisks
    keywordsSemiconductor wafers
    keywordsEquations AND Measurement
    treeJournal of Tribology:;2005:;volume( 127 ):;issue: 001
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
    نرم افزار کتابخانه دیجیتال "دی اسپیس" فارسی شده توسط یابش برای کتابخانه های ایرانی | تماس با یابش
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