Show simple item record

contributor authorSum Huan Ng
contributor authorLen Borucki
contributor authorC. Fred Higgs
contributor authorInho Yoon
contributor authorAndrés Osorno
contributor authorSteven Danyluk
date accessioned2017-05-09T00:18:03Z
date available2017-05-09T00:18:03Z
date copyrightJanuary, 2005
date issued2005
identifier issn0742-4787
identifier otherJOTRE9-28729#198_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/132753
description abstractPrevious experimental work has shown that negative fluid pressure does develop at the disk/pad interface during chemical mechanical polishing. However, these studies dealt with one-dimensional measurement and modeling. To better understand the problem, two-dimensional pressure mapping is carried out. In addition, the orientation of the disk is measured with a capacitive sensing technique. Results reveal a large negative pressure region at the disk/pad interface that is skewed toward the leading edge of the disk. The disk is also found to be leaning down toward the leading edge and toward the center of the pad. A mixed-lubrication model based on the Reynolds equation and taking into account the disk orientation angles has been developed. Modeling and experimental results show similar trends, indicating the tilting of the disk as a dominant factor in causing the negative pressure phenomenon.
publisherThe American Society of Mechanical Engineers (ASME)
titleTilt and Interfacial Fluid Pressure Measurements of a Disk Sliding on a Polymeric Pad
typeJournal Paper
journal volume127
journal issue1
journal titleJournal of Tribology
identifier doi10.1115/1.1829718
journal fristpage198
journal lastpage205
identifier eissn1528-8897
keywordsPressure
keywordsFluid pressure
keywordsStress
keywordsDisks
keywordsSemiconductor wafers
keywordsEquations AND Measurement
treeJournal of Tribology:;2005:;volume( 127 ):;issue: 001
contenttypeFulltext


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record