| contributor author | Douglas S. Ruby | |
| contributor author | Saleem Zaidi | |
| contributor author | S. Narayanan | |
| contributor author | Satoshi Yamanaka | |
| contributor author | Ruben Balanga | |
| date accessioned | 2017-05-09T00:17:51Z | |
| date available | 2017-05-09T00:17:51Z | |
| date copyright | February, 2005 | |
| date issued | 2005 | |
| identifier issn | 0199-6231 | |
| identifier other | JSEEDO-28367#146_1.pdf | |
| identifier uri | http://yetl.yabesh.ir/yetl/handle/yetl/132637 | |
| description abstract | We developed a maskless plasma texturing technique for multicrystalline Si (mc-Si) cells using Reactive Ion Etching (RIE) that results in higher cell performance than that of standard untextured cells. Elimination of plasma damage has been achieved while keeping front reflectance to low levels. Internal quantum efficiencies higher than those on planar and wet-textured cells have been obtained, boosting cell currents and efficiencies by up to 6% on tricrystalline Si cells. | |
| publisher | The American Society of Mechanical Engineers (ASME) | |
| title | RIE-Texturing of Industrial Multicrystalline Silicon Solar Cells | |
| type | Journal Paper | |
| journal volume | 127 | |
| journal issue | 1 | |
| journal title | Journal of Solar Energy Engineering | |
| identifier doi | 10.1115/1.1756926 | |
| journal fristpage | 146 | |
| journal lastpage | 149 | |
| identifier eissn | 1528-8986 | |
| keywords | Semiconductor wafers | |
| keywords | Plasmas (Ionized gases) | |
| keywords | Reflectance | |
| keywords | Texture (Materials) | |
| keywords | Etching | |
| keywords | Silicon | |
| keywords | Solar cells | |
| keywords | Wavelength | |
| keywords | Solar energy AND Current | |
| tree | Journal of Solar Energy Engineering:;2005:;volume( 127 ):;issue: 001 | |
| contenttype | Fulltext | |
