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    Interactions of Carbon Atoms and Dimer Vacancies on the Si(001) Surface

    Source: Journal of Engineering Materials and Technology:;2005:;volume( 127 ):;issue: 004::page 462
    Author:
    Cristian V. Ciobanu
    ,
    Adrian Barbu
    ,
    Ryan M. Briggs
    DOI: 10.1115/1.2019898
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: We investigate the interactions between substitutional carbon atoms on the defect free, (2×1) reconstructed Si(001) surface, and bring evidence that the interaction energy differs significantly from the inverse-cube distance dependence that is predicted by the theory of force dipoles on an elastic half-space. Based on Tersoff potentials, we also calculate the interactions between carbon atoms and dimer vacancies. The calculations indicate that dimer vacancies (DVs) are strongly stabilized by fourth-layer C atoms placed directly underneath them. By use of simple model Monte Carlo simulations, we show that the computed interactions between carbon atoms and DVs lead to self-assembled vacancy lines, in qualitative agreement with recent experimental results.
    keyword(s): Atoms , Carbon AND Engineering simulation ,
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      Interactions of Carbon Atoms and Dimer Vacancies on the Si(001) Surface

    URI
    http://yetl.yabesh.ir/yetl1/handle/yetl/131863
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    contributor authorCristian V. Ciobanu
    contributor authorAdrian Barbu
    contributor authorRyan M. Briggs
    date accessioned2017-05-09T00:16:16Z
    date available2017-05-09T00:16:16Z
    date copyrightOctober, 2005
    date issued2005
    identifier issn0094-4289
    identifier otherJEMTA8-27074#462_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/131863
    description abstractWe investigate the interactions between substitutional carbon atoms on the defect free, (2×1) reconstructed Si(001) surface, and bring evidence that the interaction energy differs significantly from the inverse-cube distance dependence that is predicted by the theory of force dipoles on an elastic half-space. Based on Tersoff potentials, we also calculate the interactions between carbon atoms and dimer vacancies. The calculations indicate that dimer vacancies (DVs) are strongly stabilized by fourth-layer C atoms placed directly underneath them. By use of simple model Monte Carlo simulations, we show that the computed interactions between carbon atoms and DVs lead to self-assembled vacancy lines, in qualitative agreement with recent experimental results.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleInteractions of Carbon Atoms and Dimer Vacancies on the Si(001) Surface
    typeJournal Paper
    journal volume127
    journal issue4
    journal titleJournal of Engineering Materials and Technology
    identifier doi10.1115/1.2019898
    journal fristpage462
    journal lastpage467
    identifier eissn1528-8889
    keywordsAtoms
    keywordsCarbon AND Engineering simulation
    treeJournal of Engineering Materials and Technology:;2005:;volume( 127 ):;issue: 004
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
    نرم افزار کتابخانه دیجیتال "دی اسپیس" فارسی شده توسط یابش برای کتابخانه های ایرانی | تماس با یابش
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