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    Microscale Laser Shock Peening of Thin Films, Part 1: Experiment, Modeling and Simulation

    Source: Journal of Manufacturing Science and Engineering:;2004:;volume( 126 ):;issue: 001::page 10
    Author:
    Wenwu Zhang
    ,
    I. C. Noyan
    ,
    Y. Lawrence Yao
    DOI: 10.1115/1.1645878
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Microscale Laser Shock Peening (LSP), also known as Laser Shock Processing, is a technique that can be potentially applied to manipulate residual stress distributions in metal film structures and thus improve the fatigue performances of micro-devices made of such films. In this study, microscale LSP of copper films on single crystal silicon substrate is investigated. Before and after-process curvature measurement verifies that sizable compressive residual stress can be induced in copper thin films using microscale LSP. Improved modeling work of shock pressure is summarized and the computed shock pressure is used as loading in 3D stress/strain analysis of the layered film structure. Simulation shows that the stress/strain distribution in the metal film is close to equi-biaxial and is coupled into the silicon substrate.
    keyword(s): Pressure , Thin films , Copper , Lasers , Stress , Shock (Mechanics) , Microscale devices , Modeling , Laser hardening , Silicon AND Simulation ,
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      Microscale Laser Shock Peening of Thin Films, Part 1: Experiment, Modeling and Simulation

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    http://yetl.yabesh.ir/yetl1/handle/yetl/130410
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    contributor authorWenwu Zhang
    contributor authorI. C. Noyan
    contributor authorY. Lawrence Yao
    date accessioned2017-05-09T00:13:41Z
    date available2017-05-09T00:13:41Z
    date copyrightFebruary, 2004
    date issued2004
    identifier issn1087-1357
    identifier otherJMSEFK-27800#10_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/130410
    description abstractMicroscale Laser Shock Peening (LSP), also known as Laser Shock Processing, is a technique that can be potentially applied to manipulate residual stress distributions in metal film structures and thus improve the fatigue performances of micro-devices made of such films. In this study, microscale LSP of copper films on single crystal silicon substrate is investigated. Before and after-process curvature measurement verifies that sizable compressive residual stress can be induced in copper thin films using microscale LSP. Improved modeling work of shock pressure is summarized and the computed shock pressure is used as loading in 3D stress/strain analysis of the layered film structure. Simulation shows that the stress/strain distribution in the metal film is close to equi-biaxial and is coupled into the silicon substrate.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleMicroscale Laser Shock Peening of Thin Films, Part 1: Experiment, Modeling and Simulation
    typeJournal Paper
    journal volume126
    journal issue1
    journal titleJournal of Manufacturing Science and Engineering
    identifier doi10.1115/1.1645878
    journal fristpage10
    journal lastpage17
    identifier eissn1528-8935
    keywordsPressure
    keywordsThin films
    keywordsCopper
    keywordsLasers
    keywordsStress
    keywordsShock (Mechanics)
    keywordsMicroscale devices
    keywordsModeling
    keywordsLaser hardening
    keywordsSilicon AND Simulation
    treeJournal of Manufacturing Science and Engineering:;2004:;volume( 126 ):;issue: 001
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
    نرم افزار کتابخانه دیجیتال "دی اسپیس" فارسی شده توسط یابش برای کتابخانه های ایرانی | تماس با یابش
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