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contributor authorWenwu Zhang
contributor authorI. C. Noyan
contributor authorY. Lawrence Yao
date accessioned2017-05-09T00:13:41Z
date available2017-05-09T00:13:41Z
date copyrightFebruary, 2004
date issued2004
identifier issn1087-1357
identifier otherJMSEFK-27800#10_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/130410
description abstractMicroscale Laser Shock Peening (LSP), also known as Laser Shock Processing, is a technique that can be potentially applied to manipulate residual stress distributions in metal film structures and thus improve the fatigue performances of micro-devices made of such films. In this study, microscale LSP of copper films on single crystal silicon substrate is investigated. Before and after-process curvature measurement verifies that sizable compressive residual stress can be induced in copper thin films using microscale LSP. Improved modeling work of shock pressure is summarized and the computed shock pressure is used as loading in 3D stress/strain analysis of the layered film structure. Simulation shows that the stress/strain distribution in the metal film is close to equi-biaxial and is coupled into the silicon substrate.
publisherThe American Society of Mechanical Engineers (ASME)
titleMicroscale Laser Shock Peening of Thin Films, Part 1: Experiment, Modeling and Simulation
typeJournal Paper
journal volume126
journal issue1
journal titleJournal of Manufacturing Science and Engineering
identifier doi10.1115/1.1645878
journal fristpage10
journal lastpage17
identifier eissn1528-8935
keywordsPressure
keywordsThin films
keywordsCopper
keywordsLasers
keywordsStress
keywordsShock (Mechanics)
keywordsMicroscale devices
keywordsModeling
keywordsLaser hardening
keywordsSilicon AND Simulation
treeJournal of Manufacturing Science and Engineering:;2004:;volume( 126 ):;issue: 001
contenttypeFulltext


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