| contributor author | M. A. Gevelber | |
| contributor author | M. Bufano | |
| contributor author | M. Toledo-Quiñones | |
| date accessioned | 2017-05-08T23:56:08Z | |
| date available | 2017-05-08T23:56:08Z | |
| date copyright | June, 1998 | |
| date issued | 1998 | |
| identifier issn | 0022-0434 | |
| identifier other | JDSMAA-26246#164_1.pdf | |
| identifier uri | http://yetl.yabesh.ir/yetl/handle/yetl/120183 | |
| description abstract | A nonlinear dynamic model of the chemical vapor deposition (CVD) process has been developed to aid design of a closed-loop control system. A lumped control volume analysis is used to capture important mass and fluid transients and spatial affects, while a simplified single variable equation is used to represent the complex reaction chemistry. Steady-state experimental results and model predictions are compared and the control implications of the process dynamics are discussed. | |
| publisher | The American Society of Mechanical Engineers (ASME) | |
| title | Dynamic Modeling Analysis for Control of Chemical Vapor Deposition | |
| type | Journal Paper | |
| journal volume | 120 | |
| journal issue | 2 | |
| journal title | Journal of Dynamic Systems, Measurement, and Control | |
| identifier doi | 10.1115/1.2802405 | |
| journal fristpage | 164 | |
| journal lastpage | 169 | |
| identifier eissn | 1528-9028 | |
| keywords | Chemical vapor deposition | |
| keywords | Dynamic modeling | |
| keywords | Dynamics (Mechanics) | |
| keywords | Control systems | |
| keywords | Design | |
| keywords | Fluid transients | |
| keywords | Chemistry | |
| keywords | Equations | |
| keywords | Steady state AND Dynamic models | |
| tree | Journal of Dynamic Systems, Measurement, and Control:;1998:;volume( 120 ):;issue: 002 | |
| contenttype | Fulltext | |
