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    A Model of Residual Stress in the Fabrication of Thin Glass Films

    Source: Journal of Engineering Materials and Technology:;1996:;volume( 118 ):;issue: 002::page 213
    Author:
    P. E. Murray
    DOI: 10.1115/1.2804889
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: We investigate the residual stress which occurs during fabrication of thin glass films. This research involves an innovative approach to modeling of residual stress which will be used to resolve important scientific issues related to the manufacturing of thin glass films for semiconductor devices. The validity of our results is confirmed by comparing analytical predictions of stress in glass films and experimental data reported previously.
    keyword(s): Glass , Manufacturing , Stress , Modeling AND Semiconductors (Materials) ,
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      A Model of Residual Stress in the Fabrication of Thin Glass Films

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    http://yetl.yabesh.ir/yetl1/handle/yetl/117061
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    contributor authorP. E. Murray
    date accessioned2017-05-08T23:50:21Z
    date available2017-05-08T23:50:21Z
    date copyrightApril, 1996
    date issued1996
    identifier issn0094-4289
    identifier otherJEMTA8-26978#213_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/117061
    description abstractWe investigate the residual stress which occurs during fabrication of thin glass films. This research involves an innovative approach to modeling of residual stress which will be used to resolve important scientific issues related to the manufacturing of thin glass films for semiconductor devices. The validity of our results is confirmed by comparing analytical predictions of stress in glass films and experimental data reported previously.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleA Model of Residual Stress in the Fabrication of Thin Glass Films
    typeJournal Paper
    journal volume118
    journal issue2
    journal titleJournal of Engineering Materials and Technology
    identifier doi10.1115/1.2804889
    journal fristpage213
    journal lastpage216
    identifier eissn1528-8889
    keywordsGlass
    keywordsManufacturing
    keywordsStress
    keywordsModeling AND Semiconductors (Materials)
    treeJournal of Engineering Materials and Technology:;1996:;volume( 118 ):;issue: 002
    contenttypeFulltext
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