| contributor author | P. E. Murray | |
| date accessioned | 2017-05-08T23:50:21Z | |
| date available | 2017-05-08T23:50:21Z | |
| date copyright | April, 1996 | |
| date issued | 1996 | |
| identifier issn | 0094-4289 | |
| identifier other | JEMTA8-26978#213_1.pdf | |
| identifier uri | http://yetl.yabesh.ir/yetl/handle/yetl/117061 | |
| description abstract | We investigate the residual stress which occurs during fabrication of thin glass films. This research involves an innovative approach to modeling of residual stress which will be used to resolve important scientific issues related to the manufacturing of thin glass films for semiconductor devices. The validity of our results is confirmed by comparing analytical predictions of stress in glass films and experimental data reported previously. | |
| publisher | The American Society of Mechanical Engineers (ASME) | |
| title | A Model of Residual Stress in the Fabrication of Thin Glass Films | |
| type | Journal Paper | |
| journal volume | 118 | |
| journal issue | 2 | |
| journal title | Journal of Engineering Materials and Technology | |
| identifier doi | 10.1115/1.2804889 | |
| journal fristpage | 213 | |
| journal lastpage | 216 | |
| identifier eissn | 1528-8889 | |
| keywords | Glass | |
| keywords | Manufacturing | |
| keywords | Stress | |
| keywords | Modeling AND Semiconductors (Materials) | |
| tree | Journal of Engineering Materials and Technology:;1996:;volume( 118 ):;issue: 002 | |
| contenttype | Fulltext | |
