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    Rheological Models for Thin Film EHL Contacts

    Source: Journal of Tribology:;1995:;volume( 117 ):;issue: 001::page 22
    Author:
    Siyoul Jang
    ,
    John Tichy
    DOI: 10.1115/1.2830602
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Rheological behavior in concentrated contacts has been studied extensively. In certain conditions such as a rough concentrated contact or sliding of nominally flat surfaces, films may be of molecular (nanometer) scale. The question arises as to whether the application of any viscous fluid model is appropriate. In this study, elastohydrodynamic lubrication analysis is performed on three candidate rheological models: (1) the classical case of viscosity variation with pressure, (2) an isoviscous model which idealizes porous layers on the solid surfaces representing the molecular microstructure, and (3) an isoviscous model which includes van der Waals and solvation surface forces. The latter two models predict behavior similar to classical behavior. The study is not sufficiently sensitive to determine which model best predicts experimental results, but some credence must be given to the latter two because experimental evidence suggests that Reynolds’ equation is not valid for molecularly thin films.
    keyword(s): Thin films , Fluids , Viscosity , Surface roughness , Elastohydrodynamic lubrication , Equations , Force AND Pressure ,
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      Rheological Models for Thin Film EHL Contacts

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    http://yetl.yabesh.ir/yetl1/handle/yetl/116069
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    contributor authorSiyoul Jang
    contributor authorJohn Tichy
    date accessioned2017-05-08T23:48:30Z
    date available2017-05-08T23:48:30Z
    date copyrightJanuary, 1995
    date issued1995
    identifier issn0742-4787
    identifier otherJOTRE9-28512#22_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/116069
    description abstractRheological behavior in concentrated contacts has been studied extensively. In certain conditions such as a rough concentrated contact or sliding of nominally flat surfaces, films may be of molecular (nanometer) scale. The question arises as to whether the application of any viscous fluid model is appropriate. In this study, elastohydrodynamic lubrication analysis is performed on three candidate rheological models: (1) the classical case of viscosity variation with pressure, (2) an isoviscous model which idealizes porous layers on the solid surfaces representing the molecular microstructure, and (3) an isoviscous model which includes van der Waals and solvation surface forces. The latter two models predict behavior similar to classical behavior. The study is not sufficiently sensitive to determine which model best predicts experimental results, but some credence must be given to the latter two because experimental evidence suggests that Reynolds’ equation is not valid for molecularly thin films.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleRheological Models for Thin Film EHL Contacts
    typeJournal Paper
    journal volume117
    journal issue1
    journal titleJournal of Tribology
    identifier doi10.1115/1.2830602
    journal fristpage22
    journal lastpage28
    identifier eissn1528-8897
    keywordsThin films
    keywordsFluids
    keywordsViscosity
    keywordsSurface roughness
    keywordsElastohydrodynamic lubrication
    keywordsEquations
    keywordsForce AND Pressure
    treeJournal of Tribology:;1995:;volume( 117 ):;issue: 001
    contenttypeFulltext
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