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contributor authorSiyoul Jang
contributor authorJohn Tichy
date accessioned2017-05-08T23:48:30Z
date available2017-05-08T23:48:30Z
date copyrightJanuary, 1995
date issued1995
identifier issn0742-4787
identifier otherJOTRE9-28512#22_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/116069
description abstractRheological behavior in concentrated contacts has been studied extensively. In certain conditions such as a rough concentrated contact or sliding of nominally flat surfaces, films may be of molecular (nanometer) scale. The question arises as to whether the application of any viscous fluid model is appropriate. In this study, elastohydrodynamic lubrication analysis is performed on three candidate rheological models: (1) the classical case of viscosity variation with pressure, (2) an isoviscous model which idealizes porous layers on the solid surfaces representing the molecular microstructure, and (3) an isoviscous model which includes van der Waals and solvation surface forces. The latter two models predict behavior similar to classical behavior. The study is not sufficiently sensitive to determine which model best predicts experimental results, but some credence must be given to the latter two because experimental evidence suggests that Reynolds’ equation is not valid for molecularly thin films.
publisherThe American Society of Mechanical Engineers (ASME)
titleRheological Models for Thin Film EHL Contacts
typeJournal Paper
journal volume117
journal issue1
journal titleJournal of Tribology
identifier doi10.1115/1.2830602
journal fristpage22
journal lastpage28
identifier eissn1528-8897
keywordsThin films
keywordsFluids
keywordsViscosity
keywordsSurface roughness
keywordsElastohydrodynamic lubrication
keywordsEquations
keywordsForce AND Pressure
treeJournal of Tribology:;1995:;volume( 117 ):;issue: 001
contenttypeFulltext


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