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    Friction and Wear Properties of Chemomechanically Polished Diamond Films

    Source: Journal of Tribology:;1994:;volume( 116 ):;issue: 003::page 445
    Author:
    B. K. Gupta
    ,
    Ajay Malshe
    ,
    Bharat Bhushan
    ,
    Vish V. Subramaniam
    DOI: 10.1115/1.2928862
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: The role of surface roughness on the coefficient of friction and wear of polished CVD diamond films has been investigated. Diamond films grown on single crystal silicon (001) substrates by Hot Filament Chemical Vapor Deposition (HFCVD) process were polished by a chemomechanical process in which a diamond film was polished against another diamond film in the presence of a fused alkaline oxidizer at 320°C. Friction and wear properties of these polished films were measured at elevated temperatures and in the presence of various gaseous environments. The coefficient of friction of the polished diamond films was found to be about 0.09, which is very close to that of natural diamond (0.07). The wear rate of the mating alumina ball slid against a polished diamond film was also found to be comparable, when slid natural diamond.
    keyword(s): Friction , Wear , Diamond films , Polishing , Diamonds , Chemical vapor deposition , Silicon , Surface roughness , Temperature AND Crystals ,
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      Friction and Wear Properties of Chemomechanically Polished Diamond Films

    URI
    http://yetl.yabesh.ir/yetl1/handle/yetl/114386
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    contributor authorB. K. Gupta
    contributor authorAjay Malshe
    contributor authorBharat Bhushan
    contributor authorVish V. Subramaniam
    date accessioned2017-05-08T23:45:37Z
    date available2017-05-08T23:45:37Z
    date copyrightJuly, 1994
    date issued1994
    identifier issn0742-4787
    identifier otherJOTRE9-28509#445_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/114386
    description abstractThe role of surface roughness on the coefficient of friction and wear of polished CVD diamond films has been investigated. Diamond films grown on single crystal silicon (001) substrates by Hot Filament Chemical Vapor Deposition (HFCVD) process were polished by a chemomechanical process in which a diamond film was polished against another diamond film in the presence of a fused alkaline oxidizer at 320°C. Friction and wear properties of these polished films were measured at elevated temperatures and in the presence of various gaseous environments. The coefficient of friction of the polished diamond films was found to be about 0.09, which is very close to that of natural diamond (0.07). The wear rate of the mating alumina ball slid against a polished diamond film was also found to be comparable, when slid natural diamond.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleFriction and Wear Properties of Chemomechanically Polished Diamond Films
    typeJournal Paper
    journal volume116
    journal issue3
    journal titleJournal of Tribology
    identifier doi10.1115/1.2928862
    journal fristpage445
    journal lastpage453
    identifier eissn1528-8897
    keywordsFriction
    keywordsWear
    keywordsDiamond films
    keywordsPolishing
    keywordsDiamonds
    keywordsChemical vapor deposition
    keywordsSilicon
    keywordsSurface roughness
    keywordsTemperature AND Crystals
    treeJournal of Tribology:;1994:;volume( 116 ):;issue: 003
    contenttypeFulltext
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