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contributor authorB. K. Gupta
contributor authorAjay Malshe
contributor authorBharat Bhushan
contributor authorVish V. Subramaniam
date accessioned2017-05-08T23:45:37Z
date available2017-05-08T23:45:37Z
date copyrightJuly, 1994
date issued1994
identifier issn0742-4787
identifier otherJOTRE9-28509#445_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/114386
description abstractThe role of surface roughness on the coefficient of friction and wear of polished CVD diamond films has been investigated. Diamond films grown on single crystal silicon (001) substrates by Hot Filament Chemical Vapor Deposition (HFCVD) process were polished by a chemomechanical process in which a diamond film was polished against another diamond film in the presence of a fused alkaline oxidizer at 320°C. Friction and wear properties of these polished films were measured at elevated temperatures and in the presence of various gaseous environments. The coefficient of friction of the polished diamond films was found to be about 0.09, which is very close to that of natural diamond (0.07). The wear rate of the mating alumina ball slid against a polished diamond film was also found to be comparable, when slid natural diamond.
publisherThe American Society of Mechanical Engineers (ASME)
titleFriction and Wear Properties of Chemomechanically Polished Diamond Films
typeJournal Paper
journal volume116
journal issue3
journal titleJournal of Tribology
identifier doi10.1115/1.2928862
journal fristpage445
journal lastpage453
identifier eissn1528-8897
keywordsFriction
keywordsWear
keywordsDiamond films
keywordsPolishing
keywordsDiamonds
keywordsChemical vapor deposition
keywordsSilicon
keywordsSurface roughness
keywordsTemperature AND Crystals
treeJournal of Tribology:;1994:;volume( 116 ):;issue: 003
contenttypeFulltext


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