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contributor authorE. Lu
contributor authorJ. Ni
contributor authorS. M. Wu
date accessioned2017-05-08T23:43:45Z
date available2017-05-08T23:43:45Z
date copyrightSeptember, 1994
date issued1994
identifier issn0022-0434
identifier otherJDSMAA-26207#396_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/113340
description abstractAn algorithm for generating an optimum CMM inspection path is developed to improve the throughput of CMMs. In this algorithm, a modified 3-D ray tracing technique is applied to an octree database of a CMM configuration space to detect obstacles between any two target points. After an obstacle is detected, collision-free silhouette contour vertices of the object are generated, from a selection criterion, as potential points of a vertex path. As the ray advances, a sequential-decision-making technique is used to derive the suboptimum vertex path from possible collision-free vertex paths. After the suboptimum vertex path is generated, a selection strategy is employed to ensure a correct edge path sequence for deriving an optimum edge point path. A 3-D simulation shows that the proposed global algorithm eliminates the dynamically undesirable characteristics of octree based algorithms and saves searching time in congested work spaces by finding paths around colliding objects. Actual measurement of a test part indicates that the proposed method can reduce the inspection time to less than half as compared to the interactive graphic method.
publisherThe American Society of Mechanical Engineers (ASME)
titleAn Algorithm for the Generation of an Optimum CMM Inspection Path
typeJournal Paper
journal volume116
journal issue3
journal titleJournal of Dynamic Systems, Measurement, and Control
identifier doi10.1115/1.2899234
journal fristpage396
journal lastpage404
identifier eissn1528-9028
keywordsInspection
keywordsCoordinate measuring machines
keywordsAlgorithms
keywordsOctrees
keywordsCollisions (Physics)
keywordsSpace
keywordsSimulation
keywordsRay tracing AND Databases
treeJournal of Dynamic Systems, Measurement, and Control:;1994:;volume( 116 ):;issue: 003
contenttypeFulltext


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