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    Precision Silicon Exfoliation Tool Design

    Source: Journal of Manufacturing Science and Engineering:;2022:;volume( 145 ):;issue: 002::page 24501-1
    Author:
    Ward, Martin J.
    ,
    Behera, Dipankar
    ,
    Cullinan, Michael A.
    DOI: 10.1115/1.4055320
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: The desire for thin-film silicon is motivated by the growing needs for flexible electronics, compact packaging, and advanced solar power. In previous work we have presented exfoliation as means to a cost effective way to achieve thin-film silicon and described an open loop prototype exfoliation tool that could be used to produce improved films compared to previous methods. However, controllable film thickness, film uniformity, and surface roughness were all challenges with the open loop setup. This paper describes the design, construction, and testing of an improved controlled exfoliation tool with load compensation and inline metrology for closed loop control of the exfoliation process. The exfoliation performance results are compared to those from the proof-of-concept tool and show 53% improvement in silicon uniformity and 67% improvement in average surface roughness. These improvements can be attributed to the addition of load compensation and the improvement in the precision motion of the stage, respectively.
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      Precision Silicon Exfoliation Tool Design

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    http://yetl.yabesh.ir/yetl1/handle/yetl/4292256
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    contributor authorWard, Martin J.
    contributor authorBehera, Dipankar
    contributor authorCullinan, Michael A.
    date accessioned2023-08-16T18:38:32Z
    date available2023-08-16T18:38:32Z
    date copyright9/27/2022 12:00:00 AM
    date issued2022
    identifier issn1087-1357
    identifier othermanu_145_2_024501.pdf
    identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4292256
    description abstractThe desire for thin-film silicon is motivated by the growing needs for flexible electronics, compact packaging, and advanced solar power. In previous work we have presented exfoliation as means to a cost effective way to achieve thin-film silicon and described an open loop prototype exfoliation tool that could be used to produce improved films compared to previous methods. However, controllable film thickness, film uniformity, and surface roughness were all challenges with the open loop setup. This paper describes the design, construction, and testing of an improved controlled exfoliation tool with load compensation and inline metrology for closed loop control of the exfoliation process. The exfoliation performance results are compared to those from the proof-of-concept tool and show 53% improvement in silicon uniformity and 67% improvement in average surface roughness. These improvements can be attributed to the addition of load compensation and the improvement in the precision motion of the stage, respectively.
    publisherThe American Society of Mechanical Engineers (ASME)
    titlePrecision Silicon Exfoliation Tool Design
    typeJournal Paper
    journal volume145
    journal issue2
    journal titleJournal of Manufacturing Science and Engineering
    identifier doi10.1115/1.4055320
    journal fristpage24501-1
    journal lastpage24501-8
    page8
    treeJournal of Manufacturing Science and Engineering:;2022:;volume( 145 ):;issue: 002
    contenttypeFulltext
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