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contributor authorQin, Zhao
contributor authorXu, Zhiping
contributor authorBuehler, Markus J.
date accessioned2017-05-09T01:14:50Z
date available2017-05-09T01:14:50Z
date issued2015
identifier issn0021-8936
identifier otherjam_082_10_101003.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/157005
description abstractSilicene is a twodimensional (2D) allotrope of silicon with a rippled or corrugated honeycomb structure in analogy to graphene. Its semiconducting properties make it attractive for developing future nanoelectronic devices. However, it has been challenging to obtain its naked form by using a mechanical exfoliation method as what has been applied to graphene. Here, we use fully atomistic simulations with an effective potential for the silver substrate derived from firstprinciples calculations to investigate possible ways of peeling silicene solely by mechanical force. We find that the peeling direction is critical for exfoliating silicene and the peeling at a 45 deg angle with the substrate is the most efficient one to detach silicene. Our study could help to understand the mechanics of silicene on substrates and guide the technology of isolation of silicene from the substrate on which it is synthesized.
publisherThe American Society of Mechanical Engineers (ASME)
titlePeeling Silicene From Model Silver Substrates in Molecular Dynamics Simulations
typeJournal Paper
journal volume82
journal issue10
journal titleJournal of Applied Mechanics
identifier doi10.1115/1.4030888
journal fristpage101003
journal lastpage101003
identifier eissn1528-9036
treeJournal of Applied Mechanics:;2015:;volume( 082 ):;issue: 010
contenttypeFulltext


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