| contributor author | Tuesta, Alfredo D. | |
| contributor author | Bhuiyan, Aizaz | |
| contributor author | Lucht, Robert P. | |
| contributor author | Fisher, Timothy S. | |
| date accessioned | 2017-05-09T01:11:30Z | |
| date available | 2017-05-09T01:11:30Z | |
| date issued | 2014 | |
| identifier issn | 2166-0468 | |
| identifier other | jmnm_002_03_031002.pdf | |
| identifier uri | http://yetl.yabesh.ir/yetl/handle/yetl/156002 | |
| description abstract | Rotational temperature profiles of H2 in a microwave plasma chemical vapor deposition (MPCVD) reactor were measured via coherent antiStokes Raman scattering (CARS) spectroscopy. The temperature was found to increase with reactor pressure, plasma generator power, and distance from the deposition surface. At 10 Torr, the measured temperature range was approximately 700–1200 K while at 30 Torr it was 1200–2000 K under the conditions studied. The introduction of CH4 and N2 to the plasma increased the rotational temperature consistently. These findings will aid in understanding the function of the chemical composition and reactions in the plasma environment of these reactors which, to date, remains obscure. | |
| publisher | The American Society of Mechanical Engineers (ASME) | |
| title | Laser Diagnostics of Plasma in Synthesis of Graphene Based Materials | |
| type | Journal Paper | |
| journal volume | 2 | |
| journal issue | 3 | |
| journal title | Journal of Micro and Nano | |
| identifier doi | 10.1115/1.4027547 | |
| journal fristpage | 31002 | |
| journal lastpage | 31002 | |
| identifier eissn | 1932-619X | |
| tree | Journal of Micro and Nano-Manufacturing:;2014:;volume( 002 ):;issue: 003 | |
| contenttype | Fulltext | |
