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contributor authorZhao, X.
contributor authorShin, Y. C.
date accessioned2017-05-09T01:00:41Z
date available2017-05-09T01:00:41Z
date issued2013
identifier issn1087-1357
identifier othermanu_135_06_061015.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/152427
description abstractIn this paper, the femtosecond laser ablation of silicon is investigated by a twodimensional hydrodynamic model. The ablation depth of the silicon wafer ablated in air at different laser intensities is calculated, and the corresponding experimental measurements are carried out for validation. Two different ablation regimes have been identified by varying the laser fluence. While twophoton absorption dominates in the low fluence regime (<2 J/cm2), electron heat diffusion is a major energy transport mechanism at higher laser fluences (>2 J/cm2). The ablation efficiency first increases with the laser fluence, and reaches the peak value at the laser fluence around 8 J/cm2. It starts to drop when the laser fluence further increases, because of the early plasma absorption of the laser beam energy.
publisherThe American Society of Mechanical Engineers (ASME)
titleAblation Dynamics of Silicon by Femtosecond Laser and the Role of Early Plasma
typeJournal Paper
journal volume135
journal issue6
journal titleJournal of Manufacturing Science and Engineering
identifier doi10.1115/1.4025805
journal fristpage61015
journal lastpage61015
identifier eissn1528-8935
treeJournal of Manufacturing Science and Engineering:;2013:;volume( 135 ):;issue: 006
contenttypeFulltext


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