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    Chemical Mechanical Polishing Slurries for Chemically Vapor Deposited Diamond Films

    Source: Journal of Manufacturing Science and Engineering:;2013:;volume( 135 ):;issue: 004::page 41006
    Author:
    Yuan, Zewei
    ,
    Jin, Zhuji
    ,
    Zhang, Youjun
    ,
    Wen, Quan
    DOI: 10.1115/1.4024034
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: The objective of this study is to investigate slurries for chemical mechanical polishing (CMP) of chemically vapordeposited (CVD) diamond films based on the principle of thermokinetics combined with physical and chemical properties. The study uses the mechanical work, surface energy and oxidability of a slurry with diamond carbon as the main physicalchemical indicators in selecting the slurries. The study indentifies 10 CMP slurries of different oxidants, such as potassium ferrate, potassium permanganate, chromium trioxide and potassium dichromate, for CVD diamond film polishing. Prior to a CMP process, prepolishing with a boron carbide plate is performed to prepare a CVD diamond film with acceptable surface finish and flatness. After polishing with the CMP process a CVD diamond film is examined with optical microscopy, surface profilometry, atomic force microscopy and Xray photoelectron spectroscopy for information on surface finish and quality, material removal and mechanisms. The study demonstrates that among the ten CMP slurries, the one with potassium ferrate as an oxidant provides the highest material removal rate of 0.055 mg/hour, and the best surface finish (Ra = 0.187 nm) and surface quality (no surface scratches nor pits), which is followed by potassium permanganate. It then discusses how mechanical stress may promote the chemical oxidation of an oxidant with diamond by forming “COâ€‌ and “C=Oâ€‌ on diamond surface. The study concludes that chemical mechanical polishing is effective for CVD diamond films.
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      Chemical Mechanical Polishing Slurries for Chemically Vapor Deposited Diamond Films

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    http://yetl.yabesh.ir/yetl1/handle/yetl/152364
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    contributor authorYuan, Zewei
    contributor authorJin, Zhuji
    contributor authorZhang, Youjun
    contributor authorWen, Quan
    date accessioned2017-05-09T01:00:28Z
    date available2017-05-09T01:00:28Z
    date issued2013
    identifier issn1087-1357
    identifier othermanu_135_04_041006.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/152364
    description abstractThe objective of this study is to investigate slurries for chemical mechanical polishing (CMP) of chemically vapordeposited (CVD) diamond films based on the principle of thermokinetics combined with physical and chemical properties. The study uses the mechanical work, surface energy and oxidability of a slurry with diamond carbon as the main physicalchemical indicators in selecting the slurries. The study indentifies 10 CMP slurries of different oxidants, such as potassium ferrate, potassium permanganate, chromium trioxide and potassium dichromate, for CVD diamond film polishing. Prior to a CMP process, prepolishing with a boron carbide plate is performed to prepare a CVD diamond film with acceptable surface finish and flatness. After polishing with the CMP process a CVD diamond film is examined with optical microscopy, surface profilometry, atomic force microscopy and Xray photoelectron spectroscopy for information on surface finish and quality, material removal and mechanisms. The study demonstrates that among the ten CMP slurries, the one with potassium ferrate as an oxidant provides the highest material removal rate of 0.055 mg/hour, and the best surface finish (Ra = 0.187 nm) and surface quality (no surface scratches nor pits), which is followed by potassium permanganate. It then discusses how mechanical stress may promote the chemical oxidation of an oxidant with diamond by forming “COâ€‌ and “C=Oâ€‌ on diamond surface. The study concludes that chemical mechanical polishing is effective for CVD diamond films.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleChemical Mechanical Polishing Slurries for Chemically Vapor Deposited Diamond Films
    typeJournal Paper
    journal volume135
    journal issue4
    journal titleJournal of Manufacturing Science and Engineering
    identifier doi10.1115/1.4024034
    journal fristpage41006
    journal lastpage41006
    identifier eissn1528-8935
    treeJournal of Manufacturing Science and Engineering:;2013:;volume( 135 ):;issue: 004
    contenttypeFulltext
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