Show simple item record

contributor authorAvram Bar-Cohen
contributor authorPeng Wang
date accessioned2017-05-09T00:52:19Z
date available2017-05-09T00:52:19Z
date copyrightMay, 2012
date issued2012
identifier issn0022-1481
identifier otherJHTRAO-27940#051017_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/149472
description abstractThe rapid emergence of nanoelectronics, with the consequent rise in transistor density and switching speed, has led to a steep increase in microprocessor chip heat flux and growing concern over the emergence of on-chip hot spots. The application of on-chip high flux cooling techniques is today a primary driver for innovation in the electronics industry. In this paper, the physical phenomena underpinning the most promising on-chip thermal management approaches for hot spot remediation, along with basic modeling equations and typical results are described. Attention is devoted to thermoelectric micro-coolers and two-phase microgap coolers. The advantages and disadvantages of these on-chip cooling solutions for high heat flux hot spots are evaluated and compared.
publisherThe American Society of Mechanical Engineers (ASME)
titleThermal Management of On-Chip Hot Spot
typeJournal Paper
journal volume134
journal issue5
journal titleJournal of Heat Transfer
identifier doi10.1115/1.4005708
journal fristpage51017
identifier eissn1528-8943
keywordsTemperature
keywordsCooling
keywordsSilicon chips
keywordsHeat flux
keywordsThermal management
keywordsHeat transfer coefficients
keywordsSuperlattices
keywordsSilicon AND Thickness
treeJournal of Heat Transfer:;2012:;volume( 134 ):;issue: 005
contenttypeFulltext


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record