contributor author | Lucas H. Ting | |
contributor author | Shirin Feghhi | |
contributor author | Sangyoon J. Han | |
contributor author | Marita L. Rodriguez | |
contributor author | Nathan J. Sniadecki | |
date accessioned | 2017-05-09T00:46:15Z | |
date available | 2017-05-09T00:46:15Z | |
date copyright | November, 2011 | |
date issued | 2011 | |
identifier issn | 1949-2944 | |
identifier other | JNEMAA-28072#041006_1.pdf | |
identifier uri | http://yetl.yabesh.ir/yetl/handle/yetl/147288 | |
description abstract | Soft lithography was used to replicate nanoscale features made using electron beam lithography on a polymethylmethacrylate (PMMA) master. The PMMA masters were exposed to fluorinated silane vapors to passivate its surfaces so that polydimethylsiloxane (PDMS) did not permanently bond to the master. From scanning electron microscopy, the silanization process was found to deposit a coating on the master that was a few hundreds of nanometers thick. These silane films partially concealed the nanoscale holes on the PMMA master, causing the soft lithography process to produce PDMS features with dimensions that were significantly reduced. The thickness of the silane films was directly measured on silicon or PMMA masters and was found to increase with exposure time to silane vapors. These findings indicate that the thickness of the silane coatings is a critical parameter when using soft lithography to replicate nanoscale features, and caution should be taken on how long a master is exposed to silane vapors. | |
publisher | The American Society of Mechanical Engineers (ASME) | |
title | Effect of Silanization Film Thickness in Soft Lithography of Nanoscale Features | |
type | Journal Paper | |
journal volume | 2 | |
journal issue | 4 | |
journal title | Journal of Nanotechnology in Engineering and Medicine | |
identifier doi | 10.1115/1.4005665 | |
journal fristpage | 41006 | |
identifier eissn | 1949-2952 | |
keywords | Vapors | |
keywords | Dimensions | |
keywords | Plasma desorption mass spectrometry | |
keywords | Nanoscale phenomena | |
keywords | Film thickness | |
keywords | Silicon | |
keywords | Thickness | |
keywords | Plasmas (Ionized gases) | |
keywords | Cathode rays | |
keywords | Coating processes AND Cathode ray oscilloscopes | |
tree | Journal of Nanotechnology in Engineering and Medicine:;2011:;volume( 002 ):;issue: 004 | |
contenttype | Fulltext | |