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    Effect of Silanization Film Thickness in Soft Lithography of Nanoscale Features

    Source: Journal of Nanotechnology in Engineering and Medicine:;2011:;volume( 002 ):;issue: 004::page 41006
    Author:
    Lucas H. Ting
    ,
    Shirin Feghhi
    ,
    Sangyoon J. Han
    ,
    Marita L. Rodriguez
    ,
    Nathan J. Sniadecki
    DOI: 10.1115/1.4005665
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Soft lithography was used to replicate nanoscale features made using electron beam lithography on a polymethylmethacrylate (PMMA) master. The PMMA masters were exposed to fluorinated silane vapors to passivate its surfaces so that polydimethylsiloxane (PDMS) did not permanently bond to the master. From scanning electron microscopy, the silanization process was found to deposit a coating on the master that was a few hundreds of nanometers thick. These silane films partially concealed the nanoscale holes on the PMMA master, causing the soft lithography process to produce PDMS features with dimensions that were significantly reduced. The thickness of the silane films was directly measured on silicon or PMMA masters and was found to increase with exposure time to silane vapors. These findings indicate that the thickness of the silane coatings is a critical parameter when using soft lithography to replicate nanoscale features, and caution should be taken on how long a master is exposed to silane vapors.
    keyword(s): Vapors , Dimensions , Plasma desorption mass spectrometry , Nanoscale phenomena , Film thickness , Silicon , Thickness , Plasmas (Ionized gases) , Cathode rays , Coating processes AND Cathode ray oscilloscopes ,
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      Effect of Silanization Film Thickness in Soft Lithography of Nanoscale Features

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    contributor authorLucas H. Ting
    contributor authorShirin Feghhi
    contributor authorSangyoon J. Han
    contributor authorMarita L. Rodriguez
    contributor authorNathan J. Sniadecki
    date accessioned2017-05-09T00:46:15Z
    date available2017-05-09T00:46:15Z
    date copyrightNovember, 2011
    date issued2011
    identifier issn1949-2944
    identifier otherJNEMAA-28072#041006_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/147288
    description abstractSoft lithography was used to replicate nanoscale features made using electron beam lithography on a polymethylmethacrylate (PMMA) master. The PMMA masters were exposed to fluorinated silane vapors to passivate its surfaces so that polydimethylsiloxane (PDMS) did not permanently bond to the master. From scanning electron microscopy, the silanization process was found to deposit a coating on the master that was a few hundreds of nanometers thick. These silane films partially concealed the nanoscale holes on the PMMA master, causing the soft lithography process to produce PDMS features with dimensions that were significantly reduced. The thickness of the silane films was directly measured on silicon or PMMA masters and was found to increase with exposure time to silane vapors. These findings indicate that the thickness of the silane coatings is a critical parameter when using soft lithography to replicate nanoscale features, and caution should be taken on how long a master is exposed to silane vapors.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleEffect of Silanization Film Thickness in Soft Lithography of Nanoscale Features
    typeJournal Paper
    journal volume2
    journal issue4
    journal titleJournal of Nanotechnology in Engineering and Medicine
    identifier doi10.1115/1.4005665
    journal fristpage41006
    identifier eissn1949-2952
    keywordsVapors
    keywordsDimensions
    keywordsPlasma desorption mass spectrometry
    keywordsNanoscale phenomena
    keywordsFilm thickness
    keywordsSilicon
    keywordsThickness
    keywordsPlasmas (Ionized gases)
    keywordsCathode rays
    keywordsCoating processes AND Cathode ray oscilloscopes
    treeJournal of Nanotechnology in Engineering and Medicine:;2011:;volume( 002 ):;issue: 004
    contenttypeFulltext
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