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    Analysis of Molecular Beam Epitaxy Process for Growing Nanoscale Magnesium Oxide Films

    Source: Journal of Manufacturing Science and Engineering:;2010:;volume( 132 ):;issue: 003::page 30913
    Author:
    Ghulam M. Uddin
    ,
    Zhuhua Cai
    ,
    Katherine S. Ziemer
    ,
    Abe Zeid
    ,
    Sagar Kamarthi
    DOI: 10.1115/1.4001691
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Like most nanomanufacturing processes, molecular beam epitaxy (MBE) processes are based on atomic-level control of growing films and thus are sensitive to subtle changes that make repeatability and reproducibility of desired performance indicators a nontrivial task. The gamut of challenges include insufficient understanding of atomic-level interactions, involvement of a large number of candidate process variables, lack of direct observation and measurement techniques for key performance indicators, and significant cost and time requirements for conducting experiments. A conventional design of experiment-based analysis becomes an unrealistic option due to its demand on extensive experimentation. In this paper, we present a hybrid approach that combines current process knowledge, artificial neural networks, and design of experiments (DOE) to make use of preliminary experimental data to analyze the process behavior, enhance process knowledge, and lay down foundations for cost effective systematic experimentation. Based on preliminary experimental data generated while exploring the MBE process for growing a MgO interface layer on 6H-SiC substrate, we developed a neural-network-based meta model that can interpolate and estimate the process responses to any combination of process variable settings within the input space. Using the neural-network model trained on preliminary experimental data, we estimate the process responses for a three-level full-factorial DOE runs. Based on these runs, the DOE based analysis is carried out. The results help explain the MgO film growth dynamics with respect to process variables such as substrate temperature, growth time, magnesium source temperature, and trace oxygen on the initial substrate surface. This approach can be expanded to statistically analyze the dynamics of other complex nanoprocesses when only the exploratory preliminary experimental data are available. This approach can also lay the foundation for efficient and systematic experimentation to further analyze and optimize the processes to address issues such as process repeatability and reliability.
    keyword(s): Molecular beam epitaxy , Magnesium , Oxygen , Temperature , Artificial neural networks , Nanoscale phenomena AND Experimental design ,
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      Analysis of Molecular Beam Epitaxy Process for Growing Nanoscale Magnesium Oxide Films

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    contributor authorGhulam M. Uddin
    contributor authorZhuhua Cai
    contributor authorKatherine S. Ziemer
    contributor authorAbe Zeid
    contributor authorSagar Kamarthi
    date accessioned2017-05-09T00:39:20Z
    date available2017-05-09T00:39:20Z
    date copyrightJune, 2010
    date issued2010
    identifier issn1087-1357
    identifier otherJMSEFK-28371#030913_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/144053
    description abstractLike most nanomanufacturing processes, molecular beam epitaxy (MBE) processes are based on atomic-level control of growing films and thus are sensitive to subtle changes that make repeatability and reproducibility of desired performance indicators a nontrivial task. The gamut of challenges include insufficient understanding of atomic-level interactions, involvement of a large number of candidate process variables, lack of direct observation and measurement techniques for key performance indicators, and significant cost and time requirements for conducting experiments. A conventional design of experiment-based analysis becomes an unrealistic option due to its demand on extensive experimentation. In this paper, we present a hybrid approach that combines current process knowledge, artificial neural networks, and design of experiments (DOE) to make use of preliminary experimental data to analyze the process behavior, enhance process knowledge, and lay down foundations for cost effective systematic experimentation. Based on preliminary experimental data generated while exploring the MBE process for growing a MgO interface layer on 6H-SiC substrate, we developed a neural-network-based meta model that can interpolate and estimate the process responses to any combination of process variable settings within the input space. Using the neural-network model trained on preliminary experimental data, we estimate the process responses for a three-level full-factorial DOE runs. Based on these runs, the DOE based analysis is carried out. The results help explain the MgO film growth dynamics with respect to process variables such as substrate temperature, growth time, magnesium source temperature, and trace oxygen on the initial substrate surface. This approach can be expanded to statistically analyze the dynamics of other complex nanoprocesses when only the exploratory preliminary experimental data are available. This approach can also lay the foundation for efficient and systematic experimentation to further analyze and optimize the processes to address issues such as process repeatability and reliability.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleAnalysis of Molecular Beam Epitaxy Process for Growing Nanoscale Magnesium Oxide Films
    typeJournal Paper
    journal volume132
    journal issue3
    journal titleJournal of Manufacturing Science and Engineering
    identifier doi10.1115/1.4001691
    journal fristpage30913
    identifier eissn1528-8935
    keywordsMolecular beam epitaxy
    keywordsMagnesium
    keywordsOxygen
    keywordsTemperature
    keywordsArtificial neural networks
    keywordsNanoscale phenomena AND Experimental design
    treeJournal of Manufacturing Science and Engineering:;2010:;volume( 132 ):;issue: 003
    contenttypeFulltext
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