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    Mechanistic Understanding of Material Detachment During Micro-Scale Polishing

    Source: Journal of Manufacturing Science and Engineering:;2003:;volume( 125 ):;issue: 004::page 731
    Author:
    W. Che
    ,
    A-F. Bastawros
    ,
    Y. Guo
    ,
    A. Chandra
    DOI: 10.1115/1.1619964
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: A combined experimental and modeling approach has been devised to understand the material removal mechanism during abrasion of ductile copper discs. First, single grit scratch intersection experiments are conducted at the micro-scale (with 1-30 μm depth of cut). This is followed by FEM analysis. Then a simple analytical model is developed, and the model prediction is verified against experimental observations and results from numerical simulations. A characteristic material detachment length is correlated between experimental observations and model predictions. The insights gained from this exercise may be used to develop a mechanistic model of material removal in chemical mechanical polishing (CMP) of ductile materials.
    keyword(s): Polishing , Intersections , Microscale devices , Force , Shear (Mechanics) , Finite element methods , Finite element model , Mechanisms , Copper AND Particulate matter ,
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      Mechanistic Understanding of Material Detachment During Micro-Scale Polishing

    URI
    http://yetl.yabesh.ir/yetl1/handle/yetl/128666
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    contributor authorW. Che
    contributor authorA-F. Bastawros
    contributor authorY. Guo
    contributor authorA. Chandra
    date accessioned2017-05-09T00:10:41Z
    date available2017-05-09T00:10:41Z
    date copyrightNovember, 2003
    date issued2003
    identifier issn1087-1357
    identifier otherJMSEFK-27779#731_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/128666
    description abstractA combined experimental and modeling approach has been devised to understand the material removal mechanism during abrasion of ductile copper discs. First, single grit scratch intersection experiments are conducted at the micro-scale (with 1-30 μm depth of cut). This is followed by FEM analysis. Then a simple analytical model is developed, and the model prediction is verified against experimental observations and results from numerical simulations. A characteristic material detachment length is correlated between experimental observations and model predictions. The insights gained from this exercise may be used to develop a mechanistic model of material removal in chemical mechanical polishing (CMP) of ductile materials.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleMechanistic Understanding of Material Detachment During Micro-Scale Polishing
    typeJournal Paper
    journal volume125
    journal issue4
    journal titleJournal of Manufacturing Science and Engineering
    identifier doi10.1115/1.1619964
    journal fristpage731
    journal lastpage735
    identifier eissn1528-8935
    keywordsPolishing
    keywordsIntersections
    keywordsMicroscale devices
    keywordsForce
    keywordsShear (Mechanics)
    keywordsFinite element methods
    keywordsFinite element model
    keywordsMechanisms
    keywordsCopper AND Particulate matter
    treeJournal of Manufacturing Science and Engineering:;2003:;volume( 125 ):;issue: 004
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
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