Abstract: It was recently demonstrated that scatterometry-based metrology has the capability to perform high-throughput metrology on large-area nanopatterned surfaces. However, the way this approach is currently pursued requires an ...

Abstract: This paper presents catalyst patterning techniques for promoting wafer-scale uniformity while producing taper-free high aspect ratio Si nanostructures using gold (Au) metal-assisted chemical etch (MacEtch). Typical Au ...

Abstract: In spite of the great progress made toward addressing the challenge of particle contamination in nanomanufacturing, its deleterious effect on yield is still not negligible. This is particularly true for nanofabrication ...

Abstract: A new process, decoupled functional imprint lithography (DFIL), is presented for fabricating low elastic modulus polymeric nanocarriers possessing Young's modulus of bulk material as low as sub1 MPa. This method is ...

Abstract: An in vitro cell culture system is developed for studying the uptake characteristics of nanoparticles (NPs) by endothelial cells under shear stress. Results show that the smaller polystyrene nanospheres are uptaken more ...

Abstract: Metalassisted chemical etching (MacEtch) of silicon shows reliable vertical anisotropic wet etching only in singlecrystal silicon, which limits its applications to a small number of devices. This work extends the capabilities ...

Abstract: Far-field spectral imaging, coupled with computer vision methods, is demonstrated as an effective inspection method for detection, classification, and root-cause analysis of manufacturing defects in large area Si nanopillar ...