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    Si Thin Film With Nanohole Structures to Improve Thermoelectric Performance Part 1: Effects of Shape and Arrangement in Periodic Holes

    Source: ASME Journal of Heat and Mass Transfer:;2026:;volume( 148 ):;issue:001
    Author:
    Kajinami, Nobuhiko
    ,
    Sato, Moeka
    ,
    Takahara, Yoshiya
    ,
    Hanaoka, Misaki
    ,
    Iwakawa, Manabu
    ,
    Matsumoto, Mitsuhiro
    DOI: 10.1115/1.4069677
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Abstract. Improvements in thermoelectric energy conversion are expected to enhance the performance of thermoelectric generators. The effective control of thermal transport is essential for such improvements. One of the popular methods is the utilization of phonon scattering at nanoscale structural interfaces, an approach based on the differences in the mean free path (MFP) between phonons and electric charge carriers. Nanoscale structures effectively impede the transport of phonons with long MFPs by selectively reducing thermal conductivity while minimizing the impact on electrical conductivity. In this study, we investigated the effect of periodic holes in a two-dimensional silicon thin film on thermoelectric performance. Using the Boltzmann transport equation with relaxation time approximation, we simulated the effects of hole shapes and arrangements on thermal conductivity. We unexpectedly found that H-shaped holes, the notches of which are oriented perpendicularly to the heat flow, most effectively reduce thermal conductivity.
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      Si Thin Film With Nanohole Structures to Improve Thermoelectric Performance Part 1: Effects of Shape and Arrangement in Periodic Holes

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    https://yetl.yabesh.ir/yetl1/handle/yetl/4315554
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    contributor authorKajinami, Nobuhiko
    contributor authorSato, Moeka
    contributor authorTakahara, Yoshiya
    contributor authorHanaoka, Misaki
    contributor authorIwakawa, Manabu
    contributor authorMatsumoto, Mitsuhiro
    date accessioned2026-08-23T07:45:21Z
    date available2026-08-23T07:45:21Z
    date copyright2026/01/01
    date issued2026
    identifier issn2832-8450
    identifier otherht-25-1048.pdf
    identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4315554
    description abstractAbstract. Improvements in thermoelectric energy conversion are expected to enhance the performance of thermoelectric generators. The effective control of thermal transport is essential for such improvements. One of the popular methods is the utilization of phonon scattering at nanoscale structural interfaces, an approach based on the differences in the mean free path (MFP) between phonons and electric charge carriers. Nanoscale structures effectively impede the transport of phonons with long MFPs by selectively reducing thermal conductivity while minimizing the impact on electrical conductivity. In this study, we investigated the effect of periodic holes in a two-dimensional silicon thin film on thermoelectric performance. Using the Boltzmann transport equation with relaxation time approximation, we simulated the effects of hole shapes and arrangements on thermal conductivity. We unexpectedly found that H-shaped holes, the notches of which are oriented perpendicularly to the heat flow, most effectively reduce thermal conductivity.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleSi Thin Film With Nanohole Structures to Improve Thermoelectric Performance Part 1: Effects of Shape and Arrangement in Periodic Holes
    typeJournal Paper
    journal volume148
    journal issue1
    journal titleASME Journal of Heat and Mass Transfer
    identifier doi10.1115/1.4069677
    treeASME Journal of Heat and Mass Transfer:;2026:;volume( 148 ):;issue:001
    contenttypeFulltext
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    DSpace software copyright © 2002-2015  DuraSpace
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