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contributor authorKajinami, Nobuhiko
contributor authorSato, Moeka
contributor authorTakahara, Yoshiya
contributor authorHanaoka, Misaki
contributor authorIwakawa, Manabu
contributor authorMatsumoto, Mitsuhiro
date accessioned2026-08-23T07:45:21Z
date available2026-08-23T07:45:21Z
date copyright2026/01/01
date issued2026
identifier issn2832-8450
identifier otherht-25-1048.pdf
identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4315554
description abstractAbstract. Improvements in thermoelectric energy conversion are expected to enhance the performance of thermoelectric generators. The effective control of thermal transport is essential for such improvements. One of the popular methods is the utilization of phonon scattering at nanoscale structural interfaces, an approach based on the differences in the mean free path (MFP) between phonons and electric charge carriers. Nanoscale structures effectively impede the transport of phonons with long MFPs by selectively reducing thermal conductivity while minimizing the impact on electrical conductivity. In this study, we investigated the effect of periodic holes in a two-dimensional silicon thin film on thermoelectric performance. Using the Boltzmann transport equation with relaxation time approximation, we simulated the effects of hole shapes and arrangements on thermal conductivity. We unexpectedly found that H-shaped holes, the notches of which are oriented perpendicularly to the heat flow, most effectively reduce thermal conductivity.
publisherThe American Society of Mechanical Engineers (ASME)
titleSi Thin Film With Nanohole Structures to Improve Thermoelectric Performance Part 1: Effects of Shape and Arrangement in Periodic Holes
typeJournal Paper
journal volume148
journal issue1
journal titleASME Journal of Heat and Mass Transfer
identifier doi10.1115/1.4069677
treeASME Journal of Heat and Mass Transfer:;2026:;volume( 148 ):;issue:001
contenttypeFulltext


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