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contributor authorLee, Pee-Yew
contributor authorHuang, Hung Ji
contributor authorKo, Tsung-Shine
contributor authorHung, Ying-Lun
contributor authorWu, Li-Yan
contributor authorFan, Jia-Jun
contributor authorLin, Yung-Sheng
date accessioned2023-11-29T19:23:27Z
date available2023-11-29T19:23:27Z
date copyright7/21/2023 12:00:00 AM
date issued7/21/2023 12:00:00 AM
date issued2023-07-21
identifier issn1087-1357
identifier othermanu_145_11_114501.pdf
identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4294723
description abstractThe fluoride-assisted galvanic replacement reaction is a conventional method for fabricating metallic dendrites on silicon wafers. However, whether bubbles affect manufacturing metallic dendrites is unclear. This study investigated the effects of bubbles on manufacturing Au dendrites and silicon nanowires through metal-assisted chemical etching. The results of manufacture under three conditions (standard, shaking, and vacuum conditions) were compared. Synchronous growth of Au dendrites and silicon nanowires were observed on the silicon wafers. The Au dendrite deposition rate was higher than the silicon etching rate. Compared with the standard condition, the vacuum condition increased the synthesis rates of Au dendrites and silicon nanowires by 1.1 and 0.2 μm/min, respectively. Therefore, the elimination of bubbles by vacuum can considerably accelerate manufacturing Au dendrites and silicon nanowires.
publisherThe American Society of Mechanical Engineers (ASME)
titleEffects of Bubbles on Manufacturing Gold Dendrites and Silicon Nanowires Through the Fluoride-Assisted Galvanic Replacement Reaction
typeJournal Paper
journal volume145
journal issue11
journal titleJournal of Manufacturing Science and Engineering
identifier doi10.1115/1.4062878
journal fristpage114501-1
journal lastpage114501-5
page5
treeJournal of Manufacturing Science and Engineering:;2023:;volume( 145 ):;issue: 011
contenttypeFulltext


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