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contributor authorJ. M. Bradford
contributor authorV. Nagpal
date accessioned2017-05-09T01:36:26Z
date available2017-05-09T01:36:26Z
date copyrightJuly, 1973
date issued1973
identifier issn0094-4289
identifier otherJEMTA8-26833#170_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/163817
description abstractAn investigation was made of the effect of cleaning the contacting surfaces of copper samples upon the strength of the diffusion bond formed. The cleaning of surfaces by filing and the diffusion bonding were carried out in high vacuum. Results showed that the bond formed between samples cleaned by filing was greater than the bond formed by samples that were not cleaned prior to bonding. An analysis is made of the data to show that the activation energy of the bonding process is much less than the activation energy of bulk self diffusion of copper.
publisherThe American Society of Mechanical Engineers (ASME)
titleEffect of Surface Contamination on the Diffusion Bonding of Copper
typeJournal Paper
journal volume95
journal issue3
journal titleJournal of Engineering Materials and Technology
identifier doi10.1115/1.3443145
journal fristpage170
journal lastpage173
identifier eissn1528-8889
keywordsCopper
keywordsDiffusion bonding (Metals)
keywordsContamination
keywordsDiffusion (Physics)
keywordsBonding AND Vacuum
treeJournal of Engineering Materials and Technology:;1973:;volume( 095 ):;issue: 003
contenttypeFulltext


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