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contributor authorJae Hun Seol
contributor authorInsun Jo
contributor authorZhen Yao
contributor authorArden L. Moore
contributor authorLi Shi
date accessioned2017-05-09T00:45:14Z
date available2017-05-09T00:45:14Z
date copyrightFebruary, 2011
date issued2011
identifier issn0022-1481
identifier otherJHTRAO-27906#022403_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/146773
description abstractWe have developed a nanofabricated resistance thermometer device to measure the thermal conductivity of graphene monolayers exfoliated onto silicon dioxide. The measurement results show that the thermal conductivity of the supported graphene is approximately 600 W/m K at room temperature. While this value is lower than the reported basal plane values for graphite and suspended graphene because of phonon leakage across the graphene-support interface, it is still considerably higher than the values for common thin film electronic materials. Here, we present a detailed discussion of the design and fabrication of the measurement device. Analytical and numerical heat transfer solutions are developed to evaluate the accuracy and uncertainty of this method for thermal conductivity measurement of high-thermal conductivity ultrathin films.
publisherThe American Society of Mechanical Engineers (ASME)
titleThermal Conductivity Measurement of Graphene Exfoliated on Silicon Dioxide
typeJournal Paper
journal volume133
journal issue2
journal titleJournal of Heat Transfer
identifier doi10.1115/1.4002608
journal fristpage22403
identifier eissn1528-8943
keywordsTemperature
keywordsThermal conductivity
keywordsGraphene
keywordsSilicon
keywordsThermal conductivity measurement
keywordsGraphite
keywordsDesign
keywordsHeat transfer AND Manufacturing
treeJournal of Heat Transfer:;2011:;volume( 133 ):;issue: 002
contenttypeFulltext


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