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contributor authorHemanth K. Dhavaleswarapu
contributor authorSuresh V. Garimella
contributor authorJayathi Y. Murthy
date accessioned2017-05-09T00:33:47Z
date available2017-05-09T00:33:47Z
date copyrightJune, 2009
date issued2009
identifier issn0022-1481
identifier otherJHTRAO-27862#061501_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/141041
description abstractThin-film evaporation from a meniscus in a confined space, which is the basis for many two-phase cooling devices, is experimentally investigated. The meniscus formed by heptane, a highly wetting liquid, on a heated fused quartz wafer is studied. Microscale infrared temperature measurements performed near the thin-film region of the evaporating meniscus reveal the temperature suppression caused by the intensive evaporation in this region. The high spatial resolution (∼6.3 μm) and high temperature sensitivity (∼20 mK) of the infrared camera allow for improved accuracy in the measurements. The effects of evaporation rate, applied heat flux, and channel width on the thin-film heat transfer distribution are also explored.
publisherThe American Society of Mechanical Engineers (ASME)
titleMicroscale Temperature Measurements Near the Triple Line of an Evaporating Thin Liquid Film
typeJournal Paper
journal volume131
journal issue6
journal titleJournal of Heat Transfer
identifier doi10.1115/1.3090525
journal fristpage61501
identifier eissn1528-8943
keywordsTemperature
keywordsHeat transfer
keywordsTemperature measurement
keywordsEvaporation
keywordsMicroscale devices
keywordsHeat flux
keywordsThin films
keywordsSemiconductor wafers
keywordsHeptane
keywordsChannels (Hydraulic engineering) AND Heat
treeJournal of Heat Transfer:;2009:;volume( 131 ):;issue: 006
contenttypeFulltext


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