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contributor authorYuwen Zhang
date accessioned2017-05-09T00:13:35Z
date available2017-05-09T00:13:35Z
date copyrightNovember, 2004
date issued2004
identifier issn1087-1357
identifier otherJMSEFK-27832#796_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/130347
description abstractA parametric study on shape and cross-sectional area of the thin film produced by Laser Chemical Vapor Deposition (LCVD) with a moving laser beam is presented. The problem is formulated in the coordinate system that moves with the laser beam, and, therefore, the problem is a quasi-steady state. The effects of laser scanning velocity, laser power, and radius of the laser beam on the shapes of the deposited film are investigated. A simulation-based correlation of the cross-sectional area is proposed based on the simulation results.
publisherThe American Society of Mechanical Engineers (ASME)
titleA Simulation-based Correlation of Cross-Sectional Area of the Thin Film Produced by Laser Chemical Vapor Deposition With a Moving Laser Beam
typeJournal Paper
journal volume126
journal issue4
journal titleJournal of Manufacturing Science and Engineering
identifier doi10.1115/1.1813478
journal fristpage796
journal lastpage800
identifier eissn1528-8935
keywordsThin films
keywordsLasers
keywordsSimulation
keywordsChemical vapor deposition
keywordsLaser beams AND Shapes
treeJournal of Manufacturing Science and Engineering:;2004:;volume( 126 ):;issue: 004
contenttypeFulltext


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