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contributor authorRama Subba Reddy Gorla
contributor authorLarry W. Byrd
date accessioned2017-05-09T00:00:00Z
date available2017-05-09T00:00:00Z
date copyrightSeptember, 1999
date issued1999
identifier issn0098-2202
identifier otherJFEGA4-27142#651_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/122333
description abstractNonlinear thin film rupture has been analyzed by investigating the stability of films under the influence of a nonuniform electrostatic field to finite amplitude disturbances. The dynamics of the liquid film is formulated using the Navier-Stokes equations including a body force term due to van der Waals attractions. The effect of the electric field is included in the analysis only in the boundary condition at the liquid vapor interface. The governing equation was solved by finite difference method as part of an initial value problem for spatial periodic boundary conditions. The electric field stabilizes the film and increases the time to rupture when a long wavelength perturbation is introduced.
publisherThe American Society of Mechanical Engineers (ASME)
titleEffect of Electrostatic Field on Film Rupture
typeJournal Paper
journal volume121
journal issue3
journal titleJournal of Fluids Engineering
identifier doi10.1115/1.2823519
journal fristpage651
journal lastpage655
identifier eissn1528-901X
keywordsRupture
keywordsBoundary-value problems
keywordsElectric fields
keywordsWavelength
keywordsVapors
keywordsNavier-Stokes equations
keywordsDynamics (Mechanics)
keywordsForce
keywordsStability
keywordsThin films
keywordsEquations
keywordsFinite difference methods AND Liquid films
treeJournal of Fluids Engineering:;1999:;volume( 121 ):;issue: 003
contenttypeFulltext


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