Central and Minimum Elastohydrodynamic Film Thickness at High Contact Pressure

Abstract

A new optical technique has been developed which is able to obtain accurate film thickness profiles across elastohydrodynamic (EHD) contacts. This has been used in conjunction with a high pressure EHD test rig to obtain both central and minimum EHD film thicknesses at high contact pressures up to 3.5 GPa. The results have been compared with the classical film thickness equations of Hamrock and Dowson and also with recent high pressure computations due to Venner. It is found that minimum film thickness falls more rapidly with applied load at high than at low contact pressures, with a film thickness/load exponent of −0.3. This confirms the findings of recent high pressure computational EHD modeling.