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contributor authorY. Imada
contributor authorK. Kamamura
contributor authorF. Honda
contributor authorK. Nakajima
date accessioned2017-05-08T23:39:43Z
date available2017-05-08T23:39:43Z
date copyrightApril, 1992
date issued1992
identifier issn0742-4787
identifier otherJOTRE9-28495#230_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/110965
description abstractEffect of humidity in atmosphere gas, air, or argon, is investigated for the tribochemical reaction in Si3 N4 – 23 percent TiN-Si3 N4 – 23 percent TiN sliding contact system using a pin-on-plate type testing machine by reciprocal movement of pin against plate. An examination is also conducted on Si3 N4 – Si3 N4 couple in comparison with the above system. The experimental results have shown that the wear rate decreases with increasing humidity, and the wear property is somewhat improved by adding a suitable amount of TiN to Si3 N4 . Reaction products formed on the interface under the sliding contact are analysed by using EPMA and XPS. It is confirmed that SiO2 (or TiO2 ) is produced on the surface during friction and wear, and the amount of SiO2 (or TiO2 ) increases with the increase of humidity. Formation of NH3 caused by development of tribochemical reaction on friction surface is examined by a spectrometric study using Nessler’s reagent. The results show that the formation of NH3 is connected directly with the amount of SiO2 (or TiO2 ), and that three types of formation rate are observed depending on the humidity.
publisherThe American Society of Mechanical Engineers (ASME)
titleThe Tribological Reaction Accompanying Friction and Wear of Silicon Nitride Containing Titanium Nitride
typeJournal Paper
journal volume114
journal issue2
journal titleJournal of Tribology
identifier doi10.1115/1.2920878
journal fristpage230
journal lastpage235
identifier eissn1528-8897
keywordsTribology
keywordsFriction
keywordsWear
keywordsSilicon nitride ceramics
keywordsTitanium
keywordsTribochemistry
keywordsTesting AND Machinery
treeJournal of Tribology:;1992:;volume( 114 ):;issue: 002
contenttypeFulltext


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