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    Control of Thin Film Growth in Chemical Vapor Deposition Manufacturing Systems: A Feasibility Study 

    Source: Journal of Manufacturing Science and Engineering:;2002:;volume( 124 ):;issue: 003:;page 715
    Author(s): Wilson K. S. Chiu; Yogesh Jaluria; Nick G. Glumac
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: A study is carried out to design and optimize Chemical Vapor Deposition (CVD) systems for material fabrication. Design and optimization of the CVD process is necessary to satisfying strong ...
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