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RISIn-Line Dimensional Metrology in Nanomanufacturing Systems Enabled by a Passive Semiconductor Wafer Alignment Mechanism
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: One of the major challenges in nanoscale manufacturing is defect control because it is difficult to measure nanoscale features in-line with the manufacturing process. Optical inspection typically is not an option at the ...
A Low-Cost, Automated Wafer Loading System With Submicron Alignment Accuracy for Nanomanufacturing and Nanometrology Applications
Publisher: The American Society of Mechanical Engineers (ASME)