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    Tolerance Increase in <i>Escherichia coli</i> O157:H7 and Methicillin-Resistant <i>Staphylococcus Aureus</i> USA300 Exposed to Low-Power Continuous Ultraviolet Radiation from Narrow-Wavelength Sources

    Source: Journal of Environmental Engineering:;2023:;Volume ( 149 ):;issue: 006::page 04023030-1
    Author:
    Saeed Keshani Langroodi
    ,
    Christopher M. Sales
    ,
    Chetan Jinadatha
    ,
    Gregory Fridman
    DOI: 10.1061/JOEEDU.EEENG-7182
    Publisher: American Society of Civil Engineers
    Abstract: Escherichia coli O157:H7 is a major cause of foodborne disease outbreaks throughout the world, while methicillin-resistant Staphylococcus aureus (MRSA) is responsible for many difficult-to-treat infections in humans. Ultraviolet (UV) irradiation is commonly used for disinfection in food processing, medical facilities, and water treatment to prevent the transmission of these pathogen. With increased use of UV disinfection technologies over the last few years because of COVID-19 and concerns about other communicable disease, it has become a concern that microbial species could develop tolerance to UV irradiation, especially when it is applied continuously. To elucidate the effect of continuous UV exposure at different wavelengths and power levels on the tolerance development of bacteria, Escherichia coli O157:H7 and MRSA)USA300 growths were investigated by continuously exposing inoculated agar plates to six different commercially available UV sources at wavelengths of 222 nm, 254 nm, 275 nm, and 405 nm. The agar plates in these experiments were partially covered by a thin acrylic sheet, which provided either complete protection from the UV to the cells directly under the sheet, no protection if significantly away from the sheet, or partial protection near the edges of the sheet due to shading or small amounts of UV reflection under the sheet at the edges. In these experiments, tolerant cells of E. coli and S. aureus were found from the 222 nm, the 405 nm, and one of the 254 nm sources. Upon examination of the power of each UV source, it was shown that the 275 nm and 254 nm sources that resulted in no tolerant cells had surface power densities [at 25 cm (10 in.)] that were more than 10–200 times greater than those that had tolerant cells. These results suggests that bacterial cells have a higher chance to develop UV tolerance under lower power UV sources (under the experimental conditions in our laboratory). Genome investigation of the tolerant colonies revealed that there are no significant differences between the cells that developed tolerance and the original organism, hinting at the need to explore the role of epigenetics mechanisms in the development of UV tolerance in these bacteria.
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      Tolerance Increase in <i>Escherichia coli</i> O157:H7 and Methicillin-Resistant <i>Staphylococcus Aureus</i> USA300 Exposed to Low-Power Continuous Ultraviolet Radiation from Narrow-Wavelength Sources

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    https://yetl.yabesh.ir/yetl1/handle/yetl/4293131
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    contributor authorSaeed Keshani Langroodi
    contributor authorChristopher M. Sales
    contributor authorChetan Jinadatha
    contributor authorGregory Fridman
    date accessioned2023-08-16T19:20:57Z
    date available2023-08-16T19:20:57Z
    date issued2023/06/01
    identifier otherJOEEDU.EEENG-7182.pdf
    identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4293131
    description abstractEscherichia coli O157:H7 is a major cause of foodborne disease outbreaks throughout the world, while methicillin-resistant Staphylococcus aureus (MRSA) is responsible for many difficult-to-treat infections in humans. Ultraviolet (UV) irradiation is commonly used for disinfection in food processing, medical facilities, and water treatment to prevent the transmission of these pathogen. With increased use of UV disinfection technologies over the last few years because of COVID-19 and concerns about other communicable disease, it has become a concern that microbial species could develop tolerance to UV irradiation, especially when it is applied continuously. To elucidate the effect of continuous UV exposure at different wavelengths and power levels on the tolerance development of bacteria, Escherichia coli O157:H7 and MRSA)USA300 growths were investigated by continuously exposing inoculated agar plates to six different commercially available UV sources at wavelengths of 222 nm, 254 nm, 275 nm, and 405 nm. The agar plates in these experiments were partially covered by a thin acrylic sheet, which provided either complete protection from the UV to the cells directly under the sheet, no protection if significantly away from the sheet, or partial protection near the edges of the sheet due to shading or small amounts of UV reflection under the sheet at the edges. In these experiments, tolerant cells of E. coli and S. aureus were found from the 222 nm, the 405 nm, and one of the 254 nm sources. Upon examination of the power of each UV source, it was shown that the 275 nm and 254 nm sources that resulted in no tolerant cells had surface power densities [at 25 cm (10 in.)] that were more than 10–200 times greater than those that had tolerant cells. These results suggests that bacterial cells have a higher chance to develop UV tolerance under lower power UV sources (under the experimental conditions in our laboratory). Genome investigation of the tolerant colonies revealed that there are no significant differences between the cells that developed tolerance and the original organism, hinting at the need to explore the role of epigenetics mechanisms in the development of UV tolerance in these bacteria.
    publisherAmerican Society of Civil Engineers
    titleTolerance Increase in Escherichia coli O157:H7 and Methicillin-Resistant Staphylococcus Aureus USA300 Exposed to Low-Power Continuous Ultraviolet Radiation from Narrow-Wavelength Sources
    typeJournal Article
    journal volume149
    journal issue6
    journal titleJournal of Environmental Engineering
    identifier doi10.1061/JOEEDU.EEENG-7182
    journal fristpage04023030-1
    journal lastpage04023030-11
    page11
    treeJournal of Environmental Engineering:;2023:;Volume ( 149 ):;issue: 006
    contenttypeFulltext
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