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    Precursor Film Formation Process Ahead Macroscopic Contact Line of Spreading Droplet on Smooth Substrate

    Source: Journal of Heat Transfer:;2012:;volume( 134 ):;issue: 005::page 51008
    Author:
    Ichiro Ueno
    ,
    Kanji Hirose
    ,
    Yusuke Kizaki
    ,
    Yoshiaki Kisara
    ,
    Yoshizumi Fukuhara
    DOI: 10.1115/1.4005638
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: The authors pay their special attention to formation process of wafer-thin liquid film, known as “precursor film,” ahead moving macroscopic contact line of a droplet spreading on a solid substrate. The spreading droplet on the solid substrate is accompanied with the movement of a visible boundary line so-called “macroscopic contact line.” Existing studies have indicated there exits a thin liquid film known as precursor film ahead the macroscopic contact line of the droplet. The present author’s group has dedicated their special effort to detect the formation process of the precursor film by applying a convectional laser interferometry and a high-speed camera, and to evaluate the spreading rate of the precursor film. In the present study, existing length of the precursor film at a very early stage of the droplet spreading is evaluated by applying a Brewster-angle microscopy as well as the interferometer. The authors extend their attention to the advancing process of the precursor film on inclined substrate.
    keyword(s): Interferometers , Semiconductor wafers , Microscopy , Lasers , Silicones , Lubrication theory , Interferometry AND Liquid films ,
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      Precursor Film Formation Process Ahead Macroscopic Contact Line of Spreading Droplet on Smooth Substrate

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    https://yetl.yabesh.ir/yetl1/handle/yetl/149462
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    contributor authorIchiro Ueno
    contributor authorKanji Hirose
    contributor authorYusuke Kizaki
    contributor authorYoshiaki Kisara
    contributor authorYoshizumi Fukuhara
    date accessioned2017-05-09T00:52:16Z
    date available2017-05-09T00:52:16Z
    date copyrightMay, 2012
    date issued2012
    identifier issn0022-1481
    identifier otherJHTRAO-27940#051008_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/149462
    description abstractThe authors pay their special attention to formation process of wafer-thin liquid film, known as “precursor film,” ahead moving macroscopic contact line of a droplet spreading on a solid substrate. The spreading droplet on the solid substrate is accompanied with the movement of a visible boundary line so-called “macroscopic contact line.” Existing studies have indicated there exits a thin liquid film known as precursor film ahead the macroscopic contact line of the droplet. The present author’s group has dedicated their special effort to detect the formation process of the precursor film by applying a convectional laser interferometry and a high-speed camera, and to evaluate the spreading rate of the precursor film. In the present study, existing length of the precursor film at a very early stage of the droplet spreading is evaluated by applying a Brewster-angle microscopy as well as the interferometer. The authors extend their attention to the advancing process of the precursor film on inclined substrate.
    publisherThe American Society of Mechanical Engineers (ASME)
    titlePrecursor Film Formation Process Ahead Macroscopic Contact Line of Spreading Droplet on Smooth Substrate
    typeJournal Paper
    journal volume134
    journal issue5
    journal titleJournal of Heat Transfer
    identifier doi10.1115/1.4005638
    journal fristpage51008
    identifier eissn1528-8943
    keywordsInterferometers
    keywordsSemiconductor wafers
    keywordsMicroscopy
    keywordsLasers
    keywordsSilicones
    keywordsLubrication theory
    keywordsInterferometry AND Liquid films
    treeJournal of Heat Transfer:;2012:;volume( 134 ):;issue: 005
    contenttypeFulltext
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