| contributor author | Chun-Hsi Su | |
| contributor author | Chii-Ruey Lin | |
| contributor author | Guo-Tsai Liau | |
| contributor author | Ching-Yu Chang | |
| date accessioned | 2017-05-09T00:29:18Z | |
| date available | 2017-05-09T00:29:18Z | |
| date copyright | December, 2008 | |
| date issued | 2008 | |
| identifier issn | 1087-1357 | |
| identifier other | JMSEFK-28044#064501_1.pdf | |
| identifier uri | http://yetl.yabesh.ir/yetl/handle/yetl/138655 | |
| description abstract | Microwave plasma jet chemical vapor deposition is used to grow array types of carbon nanotubes and diamond films on silicon substrates. In this study, we report a patterned growth of carbon nanotubes and diamond films using the barrier layer method, wherein the selective areas vary from 20×20 μm2 to 30×80 μm2. The field-emission measurement shows that the turn-on electric field for patterned carbon nanotubes and diamond films are 1.1 V/μm and 5 V/μm, respectively. Therefore, this method of site-selective growth of carbon nanotubes and diamond films can be applied to the production of field emitters. | |
| publisher | The American Society of Mechanical Engineers (ASME) | |
| title | Study on Site-Selective Growth of Carbon Nanotubes and Diamond Films With Barrier Layers | |
| type | Journal Paper | |
| journal volume | 130 | |
| journal issue | 6 | |
| journal title | Journal of Manufacturing Science and Engineering | |
| identifier doi | 10.1115/1.2976120 | |
| journal fristpage | 64501 | |
| identifier eissn | 1528-8935 | |
| keywords | Diamond films | |
| keywords | Carbon nanotubes | |
| keywords | Electron field emission | |
| keywords | Microwaves | |
| keywords | Plasma jets | |
| keywords | Silicon AND Chemical vapor deposition | |
| tree | Journal of Manufacturing Science and Engineering:;2008:;volume( 130 ):;issue: 006 | |
| contenttype | Fulltext | |
